IP Library Granted Patent US 7,438,790
Granted Patent B2
US 7,438,790 · App. 11/491,917 · Granted Oct 21, 2008

Electrode for electrolysis and process for producing the same

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Quick Facts
Patent No.
US 7,438,790
App. No.
11/491,917
Granted
Oct 21, 2008
Kind
B2
Abstract

The present invention provides an electrode for electrolysis including: a conductive substrate; and a conductive diamond formed on a surface of the conductive substrate, the conductive substrate having at least one surface shape selected from the group consisting of: (a) a surface shape of a combination of an Ra of 100-1,000-μm and an RSm of 50-10,000 μm; (b) a surface shape of a combination of an Ra of 2.5-100 μm and an RSm of 1.5-800 μm, and (c) a surface shape of a combination of an Ra of 0.01-2 μm and an RSm of 0.005-250 μm, and a process for producing the electrode.

Claims (19)

1. An electrode for electrolysis comprising:

a conductive substrate; and

a conductive diamond formed on a surface of the conductive substrate,

the conductive substrate having at least one surface shape selected from the group consisting of:

(a) a surface shape of a combination of an Ra of 100-1,000 μm and an RSm of 50-10,000 μm;

(b) a surface shape of a combination of an Ra of 2.5-100 μm and an RSm of 1.5-800 μm; and

(c) a surface shape of a combination of an Ra of 0.01-2 μm and an RSm of 0.005-250 μm.

2. The electrode for electrolysis according to claim 1 ,

wherein the surface shape (c) is a combination of an Ra of 0.01-0.1 μm and an RSm of 0.005-20 μm.

3. A process for producing an electrode for electrolysis, the process comprising:

conducting a surface treatment on a surface of a conductive substrate by at least one method selected from the group consisting of:

(a) machining to form recesses and protrusions having an Ra of 100-1,000 μm and an RSm of 50-10,000 μm on the surface of the conductive substrate;

(b) blasting to form recesses and protrusions having an Ra of 2.5-100 μm and an RSm of 1.5-800 μm; and

(c) at least one of etching and heat-treating to form recesses and protrusions having an Ra of 0.01-2 μm and an RSm of 0.005-250 μm on the surface of the conductive substrate, and

coating the conductive substrate having the recesses and protrusions with a conductive diamond layer.

4. The process for producing an electrode for electrolysis according to claim 3 ,

wherein the method (c) is at least one of etching and heat-treating to form recesses and protrusions having an Ra of 0.01-0.1 μm and an RSm of 0.005-20 μm on the surface of the conductive substrate.

5. The process for producing an electrode for electrolysis according to claim 3 ,

wherein the coating of the surface of the conductive substrate with the conductive diamond layer is conducted by the CVD method.

Assignments (2)
CHANGE OF NAME Recorded Feb 2, 2016
From: PERMELEC ELECTRODE LTD.
To: DE NORA PERMELEC LTD
Reel/Frame 037679/0984 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 25, 2006
From: HOSONUMA, MASASHI; UNO, MASAHARU; SHIBATA, TOMOYASU; NISHIKI, YOSHINORI; FURUTA, TSUNETO
To: PERMELEC ELECTRODE LTD.
Reel/Frame 018129/0764 →