Radiation-emitting semiconductor chip

1. A radiation-emitting semiconductor chip having a semiconductor body, wherein the semiconductor body comprises:

an n-conducting region;

a p-conducting region;

an active region configured to generate radiation and being arranged between the n-conducting region and the p-conducting region, electrons which are passed into the active region via the n-conducting region and holes which are passed into the active region via the p-conducting region being recombined in the active region with the generated radiation; and

a hole barrier layer arranged on an opposite side of the active region from the p-conducting region, said hole barrier layer containing a material from the III-V semiconductor material system In y Ga 1-x-y Al x N, where 0≦x≦1, y>0, x+y≦1, and y<x, the hole barrier layer being transmissive for the electrons.

2. The semiconductor chip as claimed in claim 1 , wherein the hole barrier layer is arranged between the n-conducting region and the active region or the hole barrier layer is integrated in the n-conducting region on a side of the n-conducting region that faces the active region.

3. The semiconductor chip as claimed in claim 1 , wherein the hole barrier layer adjoins the active region or the hole barrier layer delimits the active region.

4. The semiconductor chip as claimed in claim 1 , wherein x>0.

5. The semiconductor chip as claimed in claim 4 , wherein x≧0.2.

6. The semiconductor chip as claimed in claim 4 , wherein x≦0.45.

7. The semiconductor chip as claimed in claim 1 , wherein y=0.

8. The semiconductor chip as claimed in claim 1 , wherein the hole barrier layer is formed as a buffer layer, in particular for the active region.

9. The semiconductor chip as claimed in claim 1 , wherein the active region is based on the material system In y Ga 1-y N where 0<y≦1.

10. The semiconductor chip as claimed in claim 1 , wherein the hole barrier layer comprises a tunnel barrier layer which is configured such that electrons have a higher probability of tunneling through the tunnel barrier layer then holes.

11. The semiconductor chip as claimed in claim 10 , wherein the tunnel barrier layer is doped in an n-conducting manner or is embodied intrinsically.

12. The semiconductor chip as claimed in claim 1 , wherein the hole barrier layer comprises a pure hole barrier layer which blocks holes from passing through.

13. The semiconductor chip as claimed in claim 12 , wherein the pure hole barrier layer completely blocks holes from passing through.

14. The semiconductor chip as claimed in claim 1 , wherein the semiconductor chip comprises a thin-film chip.

15. The semiconductor chip as claimed in claim 1 , wherein the semiconductor body is arranged on a carrier.

16. The semiconductor chip as claimed in claim 15 , further comprising a mirror layer is arranged between the active region and the carrier.

17. The semiconductor chip as claimed in claim 16 , wherein said mirror layer is metallic.

18. A radiation-emitting semiconductor chip having a semiconductor body, wherein the semiconductor body comprises:

an n-conducting region;

a p-conducting region;

an active region configured to generate radiation and being arranged between the n-conducting region and the p-conducting region, electrons which are passed into the active region via the n-conducting region and holes which are passed into the active region via the p-conducting region being recombined in the active region with the generated radiation; and

a hole barrier layer arranged on an opposite side of the active region from the p-conducting region, said hole barrier layer containing a material from the III-V semiconductor material system In y Ga 1-x-y Al x N where 0≦x≦1, 0≦y≦1, and x+y≦1, the hole barrier layer being transmissive for the electrons;

wherein the hole barrier layer comprises a tunnel barrier layer which is configured such that electrons have a higher probability of tunneling through the tunnel barrier layer than holes, and wherein the tunnel barrier layer is doped in an n-conducting manner or is embodied intrinsically.

19. The semiconductor chip as claimed in claim 18 , wherein the tunnel barrier layer has a thickness of 8 nm or less.

20. The semiconductor chip as claimed in claim 18 , wherein the tunnel barrier layer has a thickness of 4 nm or less.

21. The semiconductor chip as claimed in claim 18 , wherein the semiconductor chip comprises a thin-film chip.

22. The semiconductor chip as claimed in claim 18 , wherein the semiconductor body is arranged on a carrier.

23. The semiconductor chip as claimed in claim 22 , further comprising a mirror layer arranged between the active region and the carrier.

24. The semiconductor chip as claimed in claim 23 , wherein said mirror layer is metallic.

25. A radiation-emitting semiconductor chip having a semiconductor body, wherein the semiconductor body comprises:

an n-conducting region;

a p-conducting region;

an active region configured to generate radiation and being arranged between the n-conducting region and the p-conducting region, electrons which are passed into the active region via the n-conducting region and holes which are passed into the active region via the p-conducting region being recombined in the active region with the generated radiation; and

a pure hole barrier layer arranged on an opposite side of the active region from the p-conducting region, said pure hole barrier layer blocking holes from passing through and containing a material from the III-V semiconductor material system In y Ga 1-x-y Al x N, where 0≦x≦1, 0≦y≦1, and x+y≦1, the pure hole barrier layer being transmissive for the electrons.

26. The semiconductor chip as claimed in claim 25 , wherein the pure hole barrier layer is completely transmissive for the electrons.

27. The semiconductor chip as claimed in claim 25 , wherein the pure hole barrier layer is doped in an n-conducting manner such that energy of a conduction band edge of the hole barrier layer is less than or equal to the energy of the conduction band edge of a layer adjoining the hole barrier layer on a side of the hole barrier layer which is opposite to the active region.

28. The semiconductor chip as claimed in claim 25 , wherein the pure hole barrier layer has a thickness of 11 nm or more.

29. The semiconductor chip as claimed in claim 25 , wherein the semiconductor chip comprises a thin-film chip.

30. The semiconductor chip as claimed in claim 25 , wherein the semiconductor body is arranged on a carrier.

31. The semiconductor chip as claimed in claim 30 , further comprising a mirror layer arranged between the active region and the carrier.

32. The semiconductor chip as claimed in claim 31 , wherein said mirror layer is metallic.