Nitride-based light emitting device and manufacturing method thereof

1. A light emitting device comprising:

an n-type cladding layer;

a p-type cladding layer;

an active layer interposed between the n-type cladding layer and the p-type cladding layer; and

an ohmic contact layer contacting the p-type cladding layer or the n-type cladding layer and comprising a first film that comprises a transparent conductive zinc oxide having a one-dimensional nano structure,

wherein the one-dimensional nano structure is at least one selected from a nano-column, a nano rod, and a nano wire.

2. The light emitting device of claim 1 , wherein the n-type cladding layer, the p-type cladding layer, and the active layer comprise nitrogen.

3. The light emitting device of claim 2 , wherein the n-type cladding layer, the p-type cladding layer, and the active layer comprise a group III nitride-based compound.

4. The light emitting device of claim 3 , wherein the n-type cladding layer, the p-type cladding layer, and the active layer comprise a compound having Al x In y Ga z N where x, y and z are integers.

5. The light emitting device of claim 1 , wherein the first film further comprises an additional ingredient comprising at least one of aluminum (Al), chromium (Cr), silicon (Si), germanium (Ge), indium (In), lithium (Li), gallium (Ga), magnesium (Mg), zinc (Zn), beryllium (Be), molybdenum (Mo), vanadium (V), copper (Cu), iridium (Ir), rhodium (Rh), ruthenium (Ru), tungsten (W), cobalt (Co), nickel (Ni), manganese (Mn), titanium (Ti), tantalum (Ta), cadmium (Cd), lanthanum (La), and oxides thereof.

6. The light emitting device of claim 5 , wherein an amount of the additional ingredient is from about 0.1 weight % to about 49 weight %.

7. The light emitting device of claim 1 , wherein the first film has a thickness equal to or greater than about ten nanometers.

8. The light emitting device of claim 1 , wherein the ohmic contact layer further comprises a second film disposed between the first film and the p-type cladding layer or the n-type cladding layer, and the second film comprises at least one of metals including Ni, Pd, Pt, Rh, Zn, In, Sn, Zn, Ag, and Au, transparent conductive oxides including ITO, SnO 2 , ZnO, In 2 O 3 , Ga 2 O 3 , RhO 2 , NiO, CoO, PdO, PtO, CuAlO 2 , CdO, and CuGaO 2 , and transparent conductive nitrides including TiN, TaN, and SiNx.

9. The light emitting device of claim 1 , further comprising:

a first electrode pad contacting the ohmic contact layer; and

a second electrode pad electrically connected to the p-type cladding layer or the n-type cladding layer and disconnected from the first electrode pad.

10. The light emitting device of claim 1 , further comprising:

a substrate;

a bonding layer disposed on the substrate;

a reflective layer disposed on the bonding layer and disposed under the p-type cladding layer or the n-type cladding layer; and

an electrode pad contacting the ohmic contact layer.