IP Library Patent Application 11502377
Patent Application
App. No. 11/502,377

Film-forming composition, insulating film and production method thereof

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Quick Facts
Patent No.
US None
App. No.
11/502,377
Abstract

A film-forming composition comprising at least one of a compound represented by formula (I) as defined in the specification, a hydrolysate of the compound represented by formula (I) and a polymerization product of at least one of the compound and the hydrolysate; an insulating film formed from the composition; and a production method thereof.

Claims (20)

1 . A film-forming composition comprising at least one of a compound represented by formula (I), a hydrolysate of the compound represented by formula (I) and a polymerization product of at least one of the compound and the hydrolysate:

wherein R 1 , R 2 , X 1 , X 2 , X 3 and X 4 each independently represents a hydrogen atom or a substituent, provided that at least two members of X 1 to X 4 represent a hydrolyzable group; and

Q represents a divalent atom or group necessary for forming a 4- or 5-membered ring together with Si—C—Si shown in formula (I).

2 . The film-forming composition according to claim 1 , which further comprises an organic solvent having a boiling point of 85° C. or more.

3 . The film-forming composition according to claim 1 , which further comprises an organic solvent having at least one of an ether group, an ester group and a ketone group.

4 . The film-forming composition according to claim 1 , which further comprises at least one of a nitric acid, an organic acid, an ammonia and an organic amine as a hydrolysis and condensation catalyst.

5 . The film-forming composition according to claim 1 , which further comprises an onium salt.

6 . The film-forming composition according to claim 1 , which further comprises at least one of a compound represented by formula (II), a hydrolysate of the compound represented by formula (II) and a polymerization product of at least one of the compound and the hydrolysate:

(R 3 ) m (X 5 ) 4-m Si  (II)

wherein R 3 represents a hydrogen atom, an alkyl group or an aryl group;

X 5 represents a hydrolyzable group; and

m represents an integer of 0 to 3.

7 . The film-forming composition according to claim 1 ,

wherein the ring formed by Q together with Si—C—Si shown in formula (I) is a 4-membered ring.

8 . The film-forming composition according to claim 1 , wherein Q is a divalent hydrocarbon group.

9 . The film-forming composition according to claim 1 , which further comprises a pore-forming agent.

10 . An insulating film formed from a film-forming composition according to claim 1 .

11 . A method for producing an insulating film, comprising:

coating a composition according to claim 1 on a substrate; and

subjecting the coated composition to a heat treatment.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2006
From: MORITA, KENSUKE
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 018180/0304 →