Insulating film-forming composition, insulating film and production method thereof

1. An insulating film-forming composition comprising:

at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1); and

at least one solvent,

wherein the at least one solvent contains an organic solvent(s) having a boiling point of 85 to 250° C. in an amount of 25 mass % or more:

wherein R 1 , R 2 , R 3 and R 4 each independently represents a hydrogen atom or a substituent, provided that at least one of R 1 and R 2 represents a hydrolyzable group; and the substituent represented by R 1 to R 4 is a halogen atom, a linear, branched or cyclic alkyl group having a carbon number of 1 to 10, an alkenyl group having a carbon number of 2 to 10, an alkynyl group having a carbon number of 2 to 10, an aryl group having a carbon number of 6 to 20, an acyl group having a carbon number of 2 to 10, an alkoxy group having a carbon number of 1 to 10, a silyloxy group having a carbon number of 3 to 10, an aryloxy group having a carbon number of 6 to 20, an acyloxy group having a carbon number of 2 to 10, or a hydroxyl group;

X 1 represents a carbon atom or a silicon atom;

L 1 represents a divalent linking group;

m represents 0 or 1; and

n represents an integer of 3 to 5 when m is 0, and represents an integer of 2 to 3 when m is 1.

2. The insulating film-forming composition according to claim 1 , wherein X 1 is a carbon atom, and L 1 is an alkylene group.

3. The insulating film-forming composition according to claim 1 , wherein m is 0.

4. The insulating film-forming composition according to claim 1 , which further comprises an organic silicon compound represented by formula (A) or a polymer of the organic silicon compound represented by formula (A):

(R a ) q —Si—(OR b ) 4-q   (A)

wherein R a represents an alkyl group, an aryl group or a heterocyclic group;

R b represents a hydrogen atom, an alkyl group, an aryl group or a silyl group, and R a and R b each may further has a substituent; and

q represents an integer of 0 to 3, and when q or 4-q is 2 or more, R a 's or R b 's may be the same or different.

5. The insulating film-forming composition according to claim 4 ,

wherein q is an integer of 0 to 2, and R b is an alkyl group.

6. The insulating film-forming composition according to claim 1 ,

wherein the organic solvent(s) has at least one of an ether group, an ester group and a carbonyl group.

7. The insulating film-forming composition according to claim 1 , which further comprises an inorganic protonic acid or an organic protonic acid.

8. The insulating film-forming composition according to claim 1 , which further comprises water.

9. The insulating film-forming composition according to claim 1 , which further comprises a surfactant.

10. An insulating film formed from an insulating film-forming composition according to claim 1 .

11. A method for producing an insulating film, comprising:

coating a composition according to claim 1 on a substrate; and

subjecting the coated composition to a heat treatment.