Variable reflectivity coatings with constant optical thickness and phase
A method of controlling phase on at least one of reflectance and transmission in an optic device. The optic device includes a multiple layer stack. At least one dimension of a first layer in the stack is varied in at least a first direction. At least one dimension of a second layer in the stack is varied in at least a second direction. The first direction and the second direction are substantially opposite. The stack is maintained at a substantially constant optical thickness.
1 . An optic device comprising:
a multiple layer structure having a substantially constant optical thickness and comprising at least a first layer and a second layer,
the first layer having an optical thickness variable in at least a first direction,
the second layer having an optical thickness variable in at least a second direction, the first direction and the second direction being substantially opposite.
2 . The device of claim 1 wherein the first layer has an optical thickness variable in at least the first direction by not greater than one quarter-wave optical thickness.
3 . The device of claim 1 wherein the second layer has an optical thickness variable in at least the second direction by not greater than one quarter-wave optical thickness.
4 . The device of claim 1 wherein the first layer and the second layer comprise similar material.
5 . The device of claim 1 wherein the first layer and the second layer are unequal in amplitude.
6 . The device of claim 1 wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has the relatively highest index.
7 . The device of claim 1 , wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has the relatively lowest index.
8 . The device of claim 1 , wherein the multiple layer structure comprises a substrate interface, an air interface and a center, and wherein at least one of the first and second layers is located closer to the center than to the substrate interface or the air interface.
9 . The device of claim 1 , wherein the multiple layer structure comprises a third layer, the third layer having an optical thickness variable in at least one of the first and second directions.
10 . The device of claim 1 wherein the optical thickness of at least one of the first layer and the second layer comprises an index of refraction and a physical dimension and at least one of the index of refraction and the physical dimension is variable.
11 . The device of claim 1 wherein the first layer and the second layer comprise dissimilar material.
12 . The device of claim 1 wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has a relatively higher index than at least some of the layers of the multiple layer structure.
13 . The device of claim 1 , wherein the multiple layer structure comprises more than two layers having an optical thickness variable in at least one of the first and second directions.
14 . The device of claim 1 wherein the first layer has an optical thickness variable in at least a first direction by a first amplitude, the second layer has an optical thickness variable in at least a second direction by a second amplitude, and wherein the first amplitude and the second amplitude are unequal.
15 . A method of making an optic device comprising:
forming a multiple layer structure comprising at least a first layer and a second layer,
varying an optical thickness of the first layer in at least a first direction,
varying an optical thickness of the second layer in at least a second direction, the first direction and the second direction being substantially opposite,
maintaining the multiple layer structure at a substantially constant optical thickness.
16 . The method of claim 15 comprising varying an optical thickness of the first layer in the first direction by not greater than one quarter-wave optical thickness.
17 . The method of claim 15 comprising varying al least one dimension of the second layer in the second direction by not greater than one quarter-wave optical thickness.
18 . The method of claim 15 wherein the first layer and the second layer comprise similar material.
19 . The method of claim 15 wherein the first layer and the second layer are unequal in amplitude.
20 . The method of claim 15 wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has the relatively highest index.
21 . The method of claim 15 , wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has the relatively lowest index.
22 . The method of claim 15 , wherein the multiple layer structure comprises a substrate interface, an air interface and a center, and further comprising the step of locating at least one of the first and second layers closer to the center than to the substrate interface or the air interface.
23 . The method of claim 15 , wherein the multiple layer structure comprises a third layer, the third layer having an optical thickness variable in at least one of the first and second directions.
24 . The method of claim 15 wherein the optical thickness of at least one of the first layer and the second layer comprises an index of refraction and a physical dimension and wherein at least one of the steps of varying an optical thickness of the first layer and varying an optical thickness of the second layer comprises varying at least one of the index of refraction and the physical dimension
25 . The method of claim 15 wherein the first layer and the second layer comprise dissimilar material.
26 . The method of claim 15 wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has a relatively higher index than at least some of the layers of the multiple layer structure.
27 . The method of claim 15 , wherein the multiple layer structure comprises more than two layers having an optical thickness variable in at least one of the first and second directions.
28 . The method of claim 15 wherein the first layer has an optical thickness variable in at least a first direction by a first amplitude, the second layer has an optical thickness variable in at least a second direction by a second amplitude, and wherein the first amplitude and the second amplitude are unequal.
29 . A method of controlling phase on at least one of reflectance and transmission in an optic device comprising a multiple layer structure, the method comprising:
varying an optical thickness of at least a first layer in the multiple layer structure in at least a first direction,
varying an optical thickness of a second layer in the multiple layer structure in at least a second direction, the first direction and the second direction being substantially opposite, and
maintaining the multiple layer structure at a substantially constant optical thickness.
30 . The method of claim 29 comprising varying an optical thickness of the first layer in the first direction by not greater than one quarter-wave optical thickness.
31 . The method of claim 29 comprising varying al least one dimension of the second layer in the second direction by not greater than one quarter-wave optical thickness.
32 . The method of claim 29 wherein the first layer and the second layer comprise similar material.
33 . The method of claim 29 wherein the first layer and the second layer are unequal in amplitude.
34 . The method of claim 29 wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has the relatively highest index.
35 . The method of claim 29 , wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has the relatively lowest index.
36 . The method of claim 29 , wherein the multiple layer structure comprises a substrate interface, an air interface and a center, and further comprising the step of locating at least one of the first and second layers closer to the center than to the substrate interface or the air interface.
37 . The method of claim 29 , wherein the multiple layer structure comprises a third layer, the third layer having an optical thickness variable in at least one of the first and second directions.
38 . The method of claim 29 wherein the optical thickness of at least one of the first layer and the second layer comprises an index of refraction and a physical dimension and wherein at least one of the steps of varying an optical thickness of the first layer and varying an optical thickness of the second layer comprises varying at least one of the index of refraction and the physical dimension
39 . The method of claim 29 wherein the first layer and the second layer comprise dissimilar material.
40 . The method of claim 29 wherein each layer of the multiple layer structure has an index and wherein at least one of the first and second layers has a relatively higher index than at least some of the layers of the multiple layer structure.
41 . The method of claim 29 , wherein the multiple layer structure comprises more than two layers having an optical thickness variable in at least one of the first and second directions.
42 . The method of claim 29 wherein the first layer has an optical thickness variable in at least a first direction by a first amplitude, the second layer has an optical thickness variable in at least a second direction by a second amplitude, and wherein the first amplitude and the second amplitude are unequal.