Nitride-based white light emitting device and manufacturing method thereof
View Patent ↗A light emitting device includes an n-type cladding layer. a p-type cladding layer. an active layer interposed between the n-type cladding layer and the p-type cladding layer and an ohmic contact layer contacting the p-type cladding layer or the n-type cladding layer. The ohmic contact layer includes a first film that includes a transparent conductive zinc oxide doped with a rare earth metal and including a one-dimensional nano structure. The one-dimensional nano structure is one of a nano-column, a nano rod and a nano wire.
1. A white light emitting device comprising:
an n-type cladding layer;
a p-type cladding layer;
an active layer interposed between the n-type cladding layer and the p-type cladding layer;
an ohmic contact layer contacting the p-type cladding layer or the n-type cladding layer and comprising a first film comprising a transparent conductive zinc oxide doped with at least one rare earth metal and including a one-dimensional nano structure; and
a first electrode pad contacting the ohmic contact layer,
wherein the one-dimensional nano structure is one of a nano-column, a nano rod, and a nano wire.
2. The white light emitting device of claim 1 , wherein the rare earth metal includes one of Er, Sm, Ce, Pr, Pm, Eu, Gd, Tb, Dy, Ho, Tm, Yb, Lu, Th, Pa, U, Np, Pu, Am, Bk, Cf, Es, Fm, Md, No, Lr, and Cm.
3. The white light emitting device of claim 2 , wherein an amount of the rare earth metal is equal to or smaller than about 20 weight %.
4. The white light emitting device of claim 1 , wherein the n-type cladding layer, the p-type cladding layer and the active layer comprise nitrogen.
5. The white light emitting device of claim 4 , wherein the n-type cladding layer, the p-type cladding layer and the active layer comprise a group III nitride-based compound.
6. The white light emitting device of claim 5 , wherein the n-type cladding layer, the p-type cladding layer and the active layer comprise a compound including Al x In y Ga z N, where x, y and z are integers.
7. The white light emitting device of claim 1 , wherein the first film further comprises an additional ingredient comprising one of aluminum (Al), chromium (Cr), silicon (Si), germanium (Ge), indium (In), lithium (Li), gallium (Ga), magnesium (Mg), zinc (Zn), beryllium (Be), molybdenum (Mo), vanadium (V), copper (Cu), iridium (Ir), rhodium (Rh), ruthenium (Ru), tungsten (W), cobalt (Co), nickel (Ni), manganese (Mn), titanium (Ti), tantalum (Ta), cadmium (Cd), lanthanum (La), and oxides thereof.
8. The white light emitting device of claim 7 , wherein an amount of the additional ingredient is from about 0.1 weight % to about 49 weight %.
9. The white light emitting device of claim 1 , wherein the first film has a thickness equal to or greater than about five nanometers.
10. The white light emitting device of claim 1 , wherein the ohmic contact layer further comprises a second film disposed between the first film and the p-type cladding layer or the n-type cladding layer, the second film comprising one of metals including Ni, Pd, Pt, Rh, Zn, In, Sn, Zn, Ag, and Au, transparent conductive oxides including ITO, SnO 2 , ZnO, In 2 O 3 , Ga 2 O 3 , RhO 2 , NiO, CoO, PdO, PtO, CuAlO 2 , CdO, and CuGaO 2 , and transparent conductive nitrides including TiN, TaN, and SiNx.
11. The white light emitting device of claim 1 , further comprising:
a second electrode pad electrically connected to the p-type cladding layer or the n-type cladding layer and disconnected from the first electrode pad.
12. The white light emitting device of claim 1 , further comprising:
a substrate;
a bonding layer disposed on the substrate;
a reflective layer disposed on the bonding layer and disposed under the p-type cladding layer or the n-type cladding layer; and
an electrode pad contacting the ohmic contact layer.