Film-forming composition, insulating film and electronic device using the same
A film forming composition comprising: (A) a compound having at least two radical reactive functional groups; and (B) at least one of a radical crosslinking agent having a structure represented by formula (I) as defined in the specification and a radical crosslinking agent having a structure represented by formula (II) as defined in the specification, an insulating film obtained by using the composition and an electronic device having the insulating film.
1 . A film forming composition comprising:
(A) a compound having at least two radical reactive functional groups; and
(B) at least one of a radical crosslinking agent having a structure represented by formula (I) and a radical crosslinking agent having a structure represented by formula (II):
wherein R 1 to R 11 each independently represents a hydrogen atom or a hydrocarbon group; and
at least any two of R 1 to R 6 or at least any two of R 7 to R 11 may be coupled to form a ring, and
wherein a plurality of the radical crosslinking agents having a structure represented by formula (I) and a plurality of the radical crosslinking agents having a structure represented by formula (II) may be coupled to form a multimer.
2 . A film forming composition comprising a composition obtained by polymerizing a film forming composition according to claim 1 by heating.
3 . The film forming composition according to claim 1 ,
wherein the radical crosslinking agent (B) has at least two alkenyl or alkynyl groups.
4 . An insulating film obtained by utilizing a film forming composition according to claim 1 .
5 . An electronic device comprising an insulating film according to claim 4.