Aqueous polishing liquid and chemical mechanical polishing method
View Patent ↗An aqueous polishing liquid is provided that includes an oxidizing agent, a five-membered monocyclic compound having at least three nitrogen atoms or a compound in which a hetero ring is fused to said compound, and a compound having an imidazole skeleton or an isothiazolin-3-one skeleton. The five-membered monocyclic compound having at least three nitrogen atoms and/or the compound in which a hetero ring is fused to said compound is used at a total concentration of less than 300 mg/L, and the compound having an imidazole skeleton or an isothiazolin-3-one skeleton is used at a concentration of at least 10 mg/L but no greater than 500 mg/L. There is also provided a chemical mechanical polishing method that includes a step of polishing by making a surface to be polished and a polishing surface move relative to each other while being in contact with each other in the presence of the aqueous polishing liquid.
1. An aqueous polishing liquid comprising:
an oxidizing agent,
a five-membered monocyclic compound having at least three nitrogen atoms or a compound in which a hetero ring is fused to said compound; and
a compound having an imidazole skeleton or an isothiazolin-3-one skeleton,
the five-membered monocyclic compound having at least three nitrogen atoms and/or the compound in which a hetero ring is fused to said compound being used at a total concentration of less than 300 mg/L, and
the compound having an imidazole skeleton or an isothiazolin-3-one skeleton being used at a concentration of at least 10 mg/L but no greater than 500 mg/L,
wherein the compound having an imidazole skeleton or an isothiazolin-3-one skeleton is a compound having an isothiazolin-3-one skeleton represented by Formula (VI) or Formula (VII),
wherein X 4 to X 7 each independently denotes a hydrogen atom or a monovalent substituent.
2. The aqueous polishing liquid according to claim 1 , wherein the compound having an imidazole skeleton or an isothiazolin-3-one skeleton is a compound containing no halogen atom.
3. The aqueous polishing liquid according to claim 1 , wherein it comprises abrasive grains.
4. The aqueous polishing liquid according to claim 1 , wherein the five-membered monocyclic compound having at least three nitrogen atoms or the compound in which a hetero ring is fused to said compound is a compound represented by any one of Formula (I) to Formula (III)
wherein R 1 and R 2 independently denote a hydrogen atom or a monovalent substituent, R 1 and R 2 may bond to each other to form a ring, and when R 1 and R 2 are simultaneously hydrogen atoms, the compound represented by Formula (I) may be a tautomer thereof,
wherein R 11 to R 13 , and R 21 to R 23 independently denote a hydrogen atom or a monovalent substituent, any two selected from R 11 to R 13 or R 21 to R 23 may bond to each other to form a ring, provided that in the present invention R 11 and R 12 are not fused to each other to form a hydrocarbon ring, and the dotted line in Formula (II) denotes that the compound represented by Formula (II) may be either a 1,2,3-triazole derivative or a 4,5-dihydro-1,2,3-triazole derivative.
5. The aqueous polishing liquid according to claim 1 , wherein the five-membered monocyclic compound having at least three nitrogen atoms or the compound in which a hetero ring is fused to said compound is tetrazole or a derivative thereof.
6. The aqueous polishing liquid according to claim 1 , wherein the rate of addition of the five-membered monocyclic compound having at least three nitrogen atoms or the compound in which a hetero ring is fused to said compound is 20 to 100 mg/L at the time of use.
7. The aqueous polishing liquid according to claim 1 , wherein the rate of addition of the compound having an imidazole skeleton or an isothiazolin-3-one skeleton is 10 to 100 mg/L at the time of use.
8. The aqueous polishing liquid according to claim 1 , wherein the rate of addition of the oxidizing agent is 0.003 to 8 mol/L at the time of use.
9. The aqueous polishing liquid according to claim 1 , wherein the pH is 4 to 8.
10. A chemical mechanical polishing method comprising:
a step of polishing by making a surface to be polished and a polishing surface move relative to each other while being in contact with each other in the presence of the aqueous polishing liquid according to claim 1 .
11. The aqueous polishing liquid according to claim 1 , wherein the compound having an imidazole skeleton or an isothiazolin-3-one skeleton is a compound selected from the group consisting of (VI-2), (VI-3), (VI-4), (VII-1), and (VII-2) below:
12. The aqueous polishing liquid according to claim 1 , wherein it comprises a chelating agent.
13. The aqueous polishing liquid according to claim 12 , wherein the chelating agent is a compound represented by Formula (1) or Formula (2) below,
wherein R 1 denotes a single bond, an alkylene group, or a phenylene group, R 2 and R 3 independently denote a hydrogen atom, a halogen atom, a carboxyl group, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, or an aryl group, R 4 and R 5 independently denote a hydrogen atom, a halogen atom, a carboxyl group, an alkyl group, or an acyl group, when R 1 is a single bond, at least one of R 4 and R 5 is not a hydrogen atom, R 6 denotes a single bond, an alkylene group, or a phenylene group, R 7 and R 8 independently denote a hydrogen atom, a halogen atom, a carboxyl group, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, or an aryl group, R 9 denotes a hydrogen atom, a halogen atom, a carboxyl group, or an alkyl group, R 10 denotes an alkylene group, and when R 10 is —CH 2 —, at least one of R 6 not being a single bond and R 9 not being a hydrogen atom is satisfied.