Liquid crystal display panel and method of fabricating thereof

1. A method of fabricating a liquid crystal display panel, comprising:

forming a gate electrode on a substrate;

forming a gate insulating film on the gate electrode formed thereon;

forming an amorphous silicon film on the gate insulating film;

forming an insulating pattern on the amorphous silicon film;

crystallizing the amorphous silicon film into a polycrystalline silicon film using a derivative metal, the polycrystalline silicon film having source, drain and channel areas, wherein the insulating pattern overlaps the channel area of the polycrystalline silicon film; and

forming source and drain electrodes on the polycrystalline silicon film, wherein the source and the drain electrodes contacting the source and drain areas of the polycrystalline silicon film, respectively;

wherein crystallizing the amorphous silicon film into a polycrystalline silicon film using a derivative metal further includes:

forming the derivative metal on the insulating pattern and the amorphous silicon film;

injecting an impurity ion into the amorphous silicon film having the derivative metal formed thereon; and

applying a heat and an electric field to the amorphous silicon film, wherein the impurity ion injected into the amorphous silicon film is activated during the application of the heat; and

wherein forming source and drain electrodes on the polycrystalline silicon film further includes:

forming sequentially a data metal layer and the photo-resist on the polycrystalline film;

forming a stepped photo-resist pattern with a mask having a partially exposing part:

etching the data metal layer and the polycrystalline silicon film using the stepped photo-resist pattern;

ashing the stepped photo-resist pattern; and

etching the data metal layer using the ashed photo-resist pattern, thereby exposing the insulating pattern overlapping the channel area of the polycrystalline silicon film.

2. The fabricating method of the liquid crystal display panel according to claim 1 , wherein the derivative metal includes nickel (Ni).

3. The fabricating method of the liquid crystal display panel according to claim 1 , wherein forming an insulating pattern on the amorphous silicon film further includes:

forming sequentially an insulating material and an photo-resist on the amorphous silicon film;

irradiating light from the backside of the substrate toward the photo-resist;

developing the photo-resist to form a photo-resist pattern; and etching the insulating material using the photo-resist pattern as a mask.

4. A method of fabricating a liquid crystal display panel, comprising:

forming a gate electrode on a substrate;

forming a gate insulating layer on the gate electrode;

depositing an amorphous silicon film on the gate insulating layer;

forming an insulating pattern on the amorphous silicon film;

forming a derivative metal on the insulating pattern and the amorphous silicon film;

crystallizing the amorphous silicon film into a polycrystalline silicon film, the polycrystalline silicon film having source, drain and channel areas; and

forming source and drain electrodes on the polycrystalline silicon film;

wherein crystallizing the amorphous silicon film into a polycrystalline silicon film using a derivative metal further includes:

forming the derivative metal on the insulating pattern and the amorphous silicon film;

injecting an impurity ion into the amorphous silicon film having the derivative metal formed thereon; and

applying a heat and an electric field to the amorphous silicon film, wherein the impurity ion injected into the amorphous silicon film is activated during the application of the heat; and

wherein forming source and drain electrodes on the polycrystalline silicon film further includes:

forming sequentially a data metal layer and the photo-resist on the polycrystalline film;

forming a stepped photo-resist pattern with a mask having a partially exposing part;

etching the data metal layer and the polycrystalline silicon film using the stepped photo-resist pattern;

ashing the stepped photo-resist pattern; and

etching the data metal layer using the ashed photo-resist pattern, thereby exposing the insulating pattern overlapping the channel area of the polycrystalline silicon film.

5. The fabricating method of the liquid crystal display panel according to claim 4 , wherein the insulating pattern is formed by a backside exposure using the gate electrode as a mask.

6. The fabricating method of the liquid crystal display panel according to claim 4 , wherein the insulating pattern overlaps the channel area of the polycrystalline silicon film.

7. The fabricating method of the liquid crystal display panel according to claim 4 , wherein the source and drain electrodes are formed using a mask having a diffractive exposing part.

8. The fabricating method of the liquid crystal display panel according to claim 5 , wherein the liquid crystal display panel is formed with four masks.

9. The fabricating method of the liquid crystal display panel according to claim 4 , further includes forming a passivation layer having a contact hole on the source and drain electrodes and forming a transparent electrode on the passivation layer.