IP Library Patent Application 11532676
Patent Application
App. No. 11/532,676

INTEGRATED MEMS PACKAGING

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Quick Facts
Patent No.
US None
App. No.
11/532,676
Abstract

A micro-electromechanical systems (MEMS) package that includes a substrate onto which is disposed or otherwise formed an active MEMS device, a first barrier wall for preventing sealant from contaminating the MEMS device, a second barrier wall for preventing sealant from contaminating unintended areas of the substrate, and a cap for hermetically sealing the MEMS package with a particular gas or mixtures thereof which enhance the MEMS performance.

Claims (65)

1 . A Microelectromechanical (MEMS) package comprising:

a MEMS device; and

a sealed cavity, in which the MEMS device is placed;

CHARACTERIZED IN THAT:

the sealed cavity includes a quantity of an electronegative gas.

2 . The MEMS package of claim 1

FURTHER CHARACTERIZED IN THAT:

the sealed cavity includes a quantity of a gas chosen from the group consisting of nitrogen, carbon dioxide, halogenated hydrocarbons, sulfur hexafluoride, FREONS, Carbon Tetrachloride, HALONS or dicarbon hexafluoride and combinations thereof.

3 . The MEMS package of claim 1

FURTHER CHARACTERIZED IN THAT:

the sealed cavity contains from 1 to 100% by volume sulfur hexafluoride.

4 . The MEMS package of claim claim 3

FURTHER CHARACTERIZED BY:

the sealed cavity is pressurized to a pressure of 0.1 to 10.0 Atmospheres.

5 . A micro-electro-mechanical system (MEMS) comprising:

a MEMS element positioned within a hermetically sealed cavity

CHARACTERIZED IN THAT:

the sealed cavity contains a quantity of an electronegative gas.

6 . The MEMS of claim 5 :

FURTHER CHARACTERIZED IN THAT:

the electronegative gas comprises sulfur hexafluoride.

7 . The MEMS of claim 5

FURTHER CHARACTERIZED IN THAT:

the hermetically sealed cavity includes a quantity of a gas chosen from the group consisting of nitrogen, carbon dioxide, halogenated hydrocarbons, sulfur hexafluoride, FREONS, Carbon Tetrachloride, HALONS or dicarbon hexafluoride and combinations thereof.

8 . The MEMS of claim 5 wherein said cavity contains from 1% to 100% by volume sulfur hexafluoride gas.

9 . The MEMS of claim 5 wherein said MEMS includes a switch that withstands high voltages.

10 . A MEMS package comprising:

a substrate provided with a MEMS element thereon;

a first barrier wall disposed upon the substrate and surrounding the MEMS element;

a second barrier wall disposed upon the substrate and surrounding the first barrier wall;

a cap overlying a top surface of said first barrier wall and said second barrier wall such that a cavity is defined containing said MEMS element.

11 . The MEMS package of claim 10 wherein said cap is affixed and said cavity is hermetically sealed.

12 . The MEMS package of claim 11 further comprising:

a moat region defined as the area between the inner barrier wall and the outer barrier wall; and

a sealant disposed within the moat region for sealing the cap.

13 . The MEMS package of claim 11 further comprising:

a bonding pad disposed within the moat region, said bonding pad being affixed to the cap through the effect of the sealant.

14 . The MEMS package of claim 12 wherein said cap includes a stepped region which engages the first barrier wall and the second barrier wall when the cap is sealed.

15 . A micro-electromechanical-system (MEMS) package comprising:

a means for structurally supporting the MEMS device;

a means for hermetically covering the MEMS device;

a means for sealing the heremetic covering means to the substrate

16 . The MEMS package according to claim 15 further comprising:

a means for preventing the sealing means from intruding into the hermetically covered regions.

17 . The MEMS package according to claim 16 further comprising:

a means for preventing the sealing means from intruding onto undesirable surfaces of the substrate.

18 . The MEMS package according to claim 16 further comprising:

a means for mechanically fixing the physical position of the hermetically covering means relative to the structural supporting means.

19 . The MEMS package according to claim 15 further comprising:

a quantity of an electronegative gas contained within the hermetically covered region.

20 . The MEMS package according to claim 19 further comprising:

a fixed quantity of a gas within the cavity region, said gas chosen from the group consisting of nitrogen, carbon dioxide, halogenated hydrocarbons, sulfur hexafluoride, FREONS, Carbon Tetrachloride, HALONS or dicarbon hexafluoride and combinations thereof.

21 . A MEMS package comprising:

a substrate;

a first barrier wall disposed upon the substrate;

a second barrier wall disposed upon the substrate such that a region is defined between the first barrier wall and the second barrier wall;

a cap overlying the first barrier wall, the second barrier wall and the region between the first barrier wall and the second barrier wall such that a cavity region is defined by the first barrier wall, the substrate and the cap wherein said cap engages the region between the first barrier wall and the second barrier wall and the cavity region; and

a MEMS device positioned within the cavity region.

22 . The MEMS package according to claim 21 further comprising:

a fixed quantity of a gas within the cavity region, said gas chosen from the group consisting of nitrogen, carbon dioxide, halogenated hydrocarbons, sulfur hexafluoride, FREONS, Carbon Tetrachloride, HALONS or dicarbon hexafluoride and combinations thereof.

23 . The MEMS package according to claim 22 wherein at least of one of the barrier walls is in physical contact with the cap.

24 . The MEMS package according to claim 22 further comprising:

a bonding pad disposed in the region between the first barrier wall and the second barrier wall, said bonding pad being bonded to the cap such that at least a portion of the cavity region is hermetically sealed.

25 . The MEMS package according to claim 24 wherein at least one of the barrier walls are sized to prevent further downward movement of the cap.

26 . The MEMS package according to claim 22 wherein the fixed quantity of gas includes at least 1 PPM sulfur hexafluoride.

Assignments (6)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE OF THE ASSIGNMENT DOCUMENT FROM DECEMBER 8, 2008, TO DECEMBER 22, 2008. PREVIOUSLY RECORDED ON REEL 023148 FRAME 0147. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jun 1, 2011
From: SIMPLER NETWORKS, INC.
To: SIMARD BEAUDRY CONSTRUCTION INC.
Reel/Frame 026366/0824 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2009
From: SIMPLER NETWORKS, INC.
To: SIMARD BEAUDRY CONSTRUCTION INC.
Reel/Frame 023148/0147 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 20, 2009
From: SIMPLER NETWORKS, INC.
To: SIMARD BEAUDRY CONSTRUCTION INC.
Reel/Frame 023119/0466 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 20, 2009
From: SIMARD BEAUDRY CONSTRUCTIONS INC.
To: SIMPLER NETWORKS, INC.
Reel/Frame 023119/0481 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 20, 2009
From: SIMPLER NETWORKS, INC.
To: RESEAUX MEMS, SOCIETE EN COMMANDITE
Reel/Frame 023119/0486 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2006
From: MENARD, STEPHANE; LU, JUN
To: SIMPLER NETWORKS INC.
Reel/Frame 018521/0071 →