Passively Q-switched microlaser with controllable peak power density
View Patent ↗Geometrical design of laser microchips is disclosed that allows variation of the optical path length in the different media by simple displacement of the microchip, the movement having a non-zero projection orthogonal to the pump beam. The concept can be implemented to vary optical loss in the lasing cavity, the absorbed pump power, or the optical length of the cavity. Passively Q-switched microchip laser output performance can thus be controlled by simple transverse displacement of the microchip relative to the pump beam. The above microlaser can be combined with voltage-controlled variable-focus output optics in order to control the peak power density of the laser pulses.
1. A passively Q-switched microlaser comprising:
a) a monolithic resonant cavity formed between a first mirror and a second mirror between which, in operation, an optical path where lasing occurs is defined;
b) a gain medium disposed in the optical path within the monolithic resonant cavity for producing optical gain;
c) a saturable absorber medium disposed in the optical path within the monolithic resonant cavity, optically coupled and in physical contact with the gain medium, wherein the physical contact traverses the optical path; and
d) an input port at the first mirror for receiving pump light having a pump wavelength, for energizing said gain medium so as to produce a laser beam at a lasing wavelength, wherein in operation, the beam oscillates along the optical path between the first and second mirrors;
e) reciprocating means for linearly displacing the input port with respect to the monolithic resonant cavity in a transverse direction perpendicular to the optical path, so as to cause a corresponding transverse displacement of the laser beam with respect to the monolithic resonant cavity;
wherein at least one of the gain medium or the saturable absorber medium is wedge-shaped or includes discrete steps, whereby the transverse displacement of the input port relative to the monolithic resonant cavity by the reciprocating means causes a variation of:
i) the distance traversed by the laser beam through the gain medium; or
ii) the distance traversed by the laser beam through the saturable absorber medium;
wherein an optical path length of the laser beam between the first and the second minors substantially does not change upon the transverse displacement of the laser beam across the wedge-shaped gain medium or the wedge-shaped saturable absorber medium, or across a single step of the stepped gain medium or the stepped saturable absorber medium.
2. The microlaser in claim 1 , wherein the shape of at least one of the gain medium or the saturable absorber medium is such that in operation, the transverse displacement of the laser beam with respect to the monolithic resonant cavity results in a controlled change of at least one of pulse length and pulse energy.
3. The microlaser in claim 1 , further including a variable-focus optical element for controlling the peak power density of emitted laser pulses.
4. The microlaser in claim 1 , further comprising an end-cap of undoped optically transparent medium disposed in the optical path for adjusting a total length of the monolithic resonant cavity and for maintaining the first mirror parallel to the second minor.
5. The microlaser in claim 1 , wherein the saturable absorber medium is disposed in a position away from the first and the second mirrors, such that effects of spatial hole burning are reduced.
6. The microlaser in claim 1 , wherein the first minor is highly transmissive at the pump wavelength and highly reflective at the lasing wavelength.
7. The microlaser in claim 1 , wherein the second mirror is partially transmissive at the lasing wavelength.
8. The microlaser in claim 1 , wherein the saturable absorber medium has a first and a second surface, both of which are intersected by the laser beam.
9. The microlaser in claim 8 , wherein one of the first and second saturable absorber medium surfaces is off normal to the laser beam by an angle of between 1.4 and 45 degrees.
10. The microlaser in claim 8 , wherein both of the saturable absorber medium surfaces are not normal to the laser beam.
11. The microlaser in claim 8 , wherein one of the surfaces of the saturable absorber medium is one of planar, cylindrical, and spherical.
12. The microlaser in claim 8 , wherein both surfaces of the saturable absorber are symmetrical about a plane normal to the optical path.
13. The microlaser in claim 1 , wherein the gain medium has a first and a second surface, both of which are intersected by the laser beam.
14. The microlaser in claim 13 , wherein one of the gain medium surfaces is off normal to the laser beam by an angle of between 1.4 and 45 degrees.
15. The microlaser in claim 13 , wherein both of the gain medium surfaces are not normal to the laser beam.
16. The microlaser in claim 13 , wherein one of the surfaces of the gain medium is one of planar, cylindrical and spherical.
17. The microlaser in claim 13 , wherein both surfaces of the gain medium are symmetrical about a plane normal to the optical path.
18. The microlaser in claim 1 , wherein the saturable absorber medium and the gain medium are bonded at a common interface.
19. A method for controlling output parameters of the microlaser in claim 1 comprising the steps of:
e) applying pump laser energy to the input port so that the gain medium is energized to produce a lasing beam which oscillates between the first and second mirrors;
f) by means of a linear translation stage displacing the input port with respect to the monolithic resonant cavity along a direction approximately parallel to the first mirror; and
g) collecting a laser output beam at the second minor wherein the desired output parameters are adjusted by positioning the linear translation stage.