IP Library Granted Patent US 7,637,158
Granted Patent B2
US 7,637,158 · App. 11/539,181 · Granted Dec 29, 2009

Excitation in micromechanical devices

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Quick Facts
Patent No.
US 7,637,158
App. No.
11/539,181
Granted
Dec 29, 2009
Kind
B2
Abstract

A resonant structure for a micromechanical device includes a crystalline silicon beam and at least one mass attached to the beam. An excitation plane of the resonant structure is defined by the predominant motion of the excited resonant structure. The beam includes crystal axes aligned such that none of the crystal axes are parallel to the length of the beam and/or none of the crystal axes are normal to the excitation plane.

Claims (11)

1. A micromechanical device comprising:

a resonant structure comprising a crystalline silicon beam and at least one mass attached to the beam, wherein the beam is connected with a supporting structure at first and second opposing ends of the beam, the beam further includes crystal axes aligned such that no crystal axis is parallel to a length of the beam and/or no crystal axis is normal to a surface of the at least one mass, and the resonant structure is configured such that, during use of the micromechanical device, when the resonant structure is excited in a direction normal to the surface of the at least one mass, motion of the excited resonant structure predominantly takes place in a plane substantially parallel to the surface of the at least one mass; and

an excitation component arranged to excite motion of the resonant structure in a direction normal to the surface of the at least one mass.

2. The micromechanical device according to claim 1 , wherein the resonant structure comprises a motion sensing element.

3. The micromechanical device according to claim 1 , wherein the device comprises a sensing device that further comprises a detection component arranged to detect, during use of the micromechanical device, motion not caused by the excitation component, wherein the motion not caused by the excitation component is in a direction normal to the plane substantially parallel to the surface of the at least one mass.

4. The micromechanical device according to claim 1 , wherein the resonant structure is arranged to be excitable to a predominantly rotational excitation mode.

5. The micromechanical device according to claim 1 , wherein the device comprises a power generation device and the resonant structure is arranged to be excitable to a predominantly rotational excitation mode, the resonant structure is fixed to a wheel such that, during use, a rotational axis of the excited resonant structure is substantially perpendicular to a rotational axis of the wheel, and the micromechanical device further comprises a power extraction component configured to generate power via converting Coriolis motion of the excited resonant structure.

6. The micromechanical device according to claim 1 , wherein the excitation component is arranged to electrostatically excite motion of the resonant structure.

7. A method of exciting a resonant structure in a desired plane in a micromechanical device, the method comprising:

providing a resonant structure comprising a crystalline silicon beam including crystal axes aligned such that no crystal axis is parallel to the length of the beam and/or no crystal axis is normal to the desired plane, and at least one mass attached to the beam, wherein the beam is connected with a supporting structure at first and second opposing ends of the beam; and

exciting motion of the resonant structure in a direction normal to the desired plane, wherein the desired plane is substantially parallel to the surface of the at least one mass.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 14, 2011
From: INFINEON TECHNOLOGIES SENSONOR AS
To: INFINEON TECHNOLOGIES AG
Reel/Frame 025637/0932 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 16, 2006
From: WESTBY, ESKILD
To: INFINEON TECHNOLOGIES SENSONOR AS
Reel/Frame 018395/0522 →