IP Library Granted Patent US 7,276,902
Granted Patent B1
US 7,276,902 · App. 11/542,891 · Granted Oct 2, 2007

Detection with evanescent wave probe

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Quick Facts
Patent No.
US 7,276,902
App. No.
11/542,891
Granted
Oct 2, 2007
Kind
B1
Abstract

Methods and systems for spatially resolved spin resonance detection in a sample of material are disclosed. Also disclosed are methods and systems for spatially resolved impedance measurements in a sample of material. The disclosed methods and samples can be used in screening of plurality of biological, chemical and material samples.

Claims (9)

1. An apparatus for spatially resolved impedance in a material sample, the apparatus comprising: an evanescent wave probe positionable adjacent to a sample location, the evanescent wave probe configured to generate an evanescent wave including at least one of a time varying amplitude and a time varying phase, a detection circuit, the detection circuit detecting a time-resolved change in a resonance frequency of the evanescent wave probe and of a change in a quality factor of the evanescent wave probe; and a processing system, the processing system processing the change in the resonance frequency and the change in a quality factor to produce an impedance measurement.

2. The apparatus of claim 1 , comprising an atomic force measuring device, the atomic force measuring device measuring an atomic force between a tip of the evanescent wave probe and a surface of a sample in the sample region to determine at least one of a topography of the surface of the sample in the sample region and a distance between the tip of the evanescent wave probe and the surface of the sample.

3. The system of claim 2 , wherein the measured atomic force includes a shear force.

4. The system of claim 2 , wherein the measured atomic force includes a normal force.

5. A method of measuring a spatially resolved impedance in a material sample, the method comprising: moving a tip of an evanescent wave probe toward a surface of a sample to place the surface of the sample within a sensing distance; generating an evanescent wave with the evanescent wave probe, the evanescent wave including at least one of a time varying amplitude and a time varying phase; making a time resolved measurement of a change in a resonant frequency of the evanescent wave probe and of a change in a quality factor of the evanescent wave probe; and determining an impedance of the sample based on the change in the resonant frequency and based on the change in the quality factor.

6. The method of claim 5 , comprising measuring an atomic force between a tip of the evanescent wave probe and a surface at the first location to determine at least one of a topography of the surface of the sample at the first location and a distance between the tip of the evanescent wave probe and the surface of the sample.

7. The method of claim 6 , wherein measuring the atomic force includes measuring a shear force.

8. The method of claim 6 , wherein measuring the atomic force includes measuring a normal force.

9. A method of screening a plurality of biological, chemical or material samples, the method comprising: making a plurality of spatially resolved impedance measurements corresponding to the plurality of samples according to claim 5 ; and selecting at least one of the plurality of samples based on the plurality of spatially resolved impedance measurements.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Apr 14, 2022
From: EAST WEST BANK
To: INTEMATIX HONG KONG CO. LIMITED; INTEMATIX CORPORATION
Reel/Frame 059910/0304 →
SECURITY INTEREST Recorded Oct 27, 2015
From: INTEMATIX HONG KONG CO. LIMITED; INTEMATIX CORPORATION
To: EAST WEST BANK
Reel/Frame 036967/0623 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2006
From: XIANG, XIAO-DONG; YANG, HAITAO; WANG, GANG
To: INTEMATIX CORPORATION
Reel/Frame 018387/0297 →