Method of manufacturing color filter substrate of liquid crystal display device

1. A method of manufacturing a color filter substrate of an LCD device comprising:

forming black matrix layers at fixed intervals on a substrate except in first, second and third pixel regions;

positioning a first printing film above the substrate, the first printing film including a first color filter printing layer, an overcoat layer, and a transforming layer; and

forming a first color filter layer and a first overcoat layer in the first pixel region by applying light to the first printing film in a region corresponding to the first pixel region.

2. The method of claim 1 , further comprising:

positioning a second printing film above the substrate including the first color filter layer, the second printing film including a second color filter printing layer, an overcoat layer, and a transforming layer; and

forming a second color filter layer and a second overcoat layer in the second pixel region by applying light to the second printing film in a region corresponding to the second pixel region.

3. The method of claim 2 , further comprising:

positioning a third printing film above the substrate including the second color filter layer, the third printing film including a third color filter printing layer, an overcoat layer, and a transforming layer; and

forming a third color filter layer and a third overcoat layer in the third pixel region by applying light to the third printing film in a region corresponding to the third pixel region.

4. The method of claim 1 , further comprising:

curing the substrate including the color filter layer and overcoat layer.

5. The method of claim 3 , further comprising:

curing the substrate including the color filter layers and overcoat layers.

6. The method of claim 4 , wherein the curing occurs at a temperature between 200° C. and 300° C.

7. The method of claim 5 , wherein the curing occurs at a temperature between 200° C. and 300° C.

8. The method of claim 4 , further comprising:

forming a common electrode layer on an entire surface of the substrate including the color filter layer and the overcoat layer after the curing process.

9. The method of claim 5 , further comprising:

forming a common electrode layer on an entire surface of the substrate including the color filter layers and overcoat layers after the curing process.

10. The method of claim 1 , wherein photolithography is used to form the black matrix layers.

11. The method of claim 3 , wherein photolithography is used to form the black matrix layers.

12. The method of claim 1 , wherein the black matrix layers are made of one of a chrome-based inorganic material and a carbon-based organic material.

13. The method of claim 1 , wherein the first printing film further includes a supporting layer made of one of polyester, polyacrylate, epoxy resin, polyethylene, polypropylene, and polystyrene.

14. The method of claim 1 , wherein the transforming layer is made of one of an organic compound of carbon black, carbon-graphitic pigment, and IR-pigment.

15. The method of claim 1 , wherein the transforming layer is made of one of aluminum (Al), tin (Sn), titanium (Ti), aluminum (Al) oxide, tin (Sn) oxide, and titanium (Ti) oxide.

16. The method of claim 1 , wherein the overcoat layer is made of an acrylic-based material including components that enhance printing properties.

17. A method of manufacturing a color filter substrate of an LCD device comprising:

forming black matrix layers on a substrate except in pixel regions;

positioning a printing film above the substrate, the printing film including a color filter printing layer, an overcoat layer, and a transforming layer; and

patterning a corresponding color filter layer and a corresponding overcoat layer in each of the pixel regions by applying light to the printing film in a region corresponding to any one of the pixel regions.

18. The method of claim 17 , further comprising:

curing the substrate including the patterned color filter layer and the patterned overcoat layer.

19. The method of claim 18 , further comprising:

forming a common electrode layer on an entire surface of the substrate including the patterned color filter layer and the patterned overcoat layer after curing the substrate.

20. The method of claim 17 , wherein photolithography is used to form the black matrix layers.