Moisture protection metal enclosure
View Patent ↗The present invention provides a substantially hermetically sealed enclosure about an active device area of a semiconductor substrate. The enclosure is created by forming a guard ring around the active device area on the substrate, and forming a metal panel over and in contact with the guard ring to enclose the active device area. The guard ring is a laminate of metal rings formed from alternating metal filled via rings and metal trace rings. The guard ring is formed on an ohmic contact ring on the surface of the substrate. An annealing process may be used to hermetically seal the guard ring to the ohmic contact ring.
1. A semiconductor device comprising:
a substrate having a surface;
a guard ring having a first gap around an active device area and over the surface of the substrate;
an additional guard ring having a second gap around the guard ring, such that the second gap is substantially spaced apart from the first gap; and
a metal panel over the guard ring such that a substantially hermetically sealed enclosure about the active device area is created by the guard ring, the metal panel, and the substrate, and an additional enclosure about the guard ring is created by the additional guard ring, the metal panel and the substrate.
2. The semiconductor device of claim 1 wherein the guard ring is a laminate of a plurality of metal rings formed from alternating at least one metal-filled via ring and at least one metal trace ring.
3. The semiconductor device of claim 1 further comprising an ohmic contact ring around the active device area and on the surface of the substrate, wherein the guard ring is formed on the ohmic contact ring to form a seal between the guard ring and the substrate.
4. The semiconductor device of claim 1 further comprising at least one dielectric layer over the active device area of the substrate, wherein the at least one dielectric layer is between the metal panel and the substrate.
5. The semiconductor device of claim 1 wherein the metal panel is a heat sink for an active device in the active device area.
6. The semiconductor device of claim 4 wherein the metal panel is formed by depositing a metal layer over the at least one dielectric layer and in direct contact with the guard ring.
7. The semiconductor device of claim 4 wherein the guard ring is formed within the at least one dielectric layer.