Deformation-based contact lithography systems, apparatus and methods
View Patent ↗One or more of a contact lithography module, a pattern tool and a substrate include a strain control region to prevent deformation-related misalignment.
1. A lithographic pattern tool, comprising:
a main body defining an outer perimeter;
a lithographic pattern region; and
a strain control region located between the outer perimeter and the lithographic pattern region, wherein the strain control region is more flexible than the main body and comprises a region of reduced thickness in the main body.
2. A pattern tool as claimed in claim 1 , further comprising:
at least one spacer associated with the main body and positioned such that the strain control region is located between the at least one spacer and the lithographic pattern region.
3. A pattern tool as claimed in claim 1 , wherein the strain control region extends completely around the lithographic pattern region.
4. A pattern tool as claimed in claim 1 , wherein the lithographic pattern region comprises a mask or a mold.
5. A pattern tool as claimed in claim 1 , wherein the strain control region is configured such that the lithographic pattern region will experience approximately zero strain when the pattern tool is deformed through the application of force to the pattern tool.
6. A pattern tool as claimed in claim 5 , further comprising:
a plurality of spacers associated with the main body and positioned such that the strain control region is located between the spacers and the lithographic pattern region.
7. A pattern tool as claimed in claim 1 , wherein the strain control region defines a first strain control region, the pattern tool further comprising:
a second strain control region located between the outer perimeter and the first strain control region.
8. A pattern tool as claimed in claim 1 , wherein the lithographic pattern region and the strain control region are integrally formed with the main body.
9. A substrate for use in deformation based lithography, comprising:
a main body defining an outer perimeter;
a target region; and
a strain control region located between the outer perimeter and the target region, wherein the strain control region is more flexible than the main body and comprises a region of reduced thickness in the main body.
10. A substrate as claimed in claim 9 , further comprising:
at least one spacer associated with the main body.
11. A substrate as claimed in claim 10 , wherein the strain control region is located between the at least one spacer and the target region.
12. A substrate as claimed in claim 9 , wherein the strain control region is configured such that the target region will experience approximately zero strain when the substrate is deformed through the application of force to the substrate.
13. A substrate as claimed in claim 12 , further comprising:
a plurality of spacers associated with the main body and positioned such that the strain control region is located between the spacers and the target region.
14. A substrate as claimed in claim 9 , wherein the strain control region extends completely around the target region.
15. A substrate as claimed in claim 9 , wherein the strain control region defines a first strain control region, the substrate further comprising:
a second strain control region located between the outer perimeter and the first strain control region.
16. A substrate as claimed in claim 9 , wherein the target region and the strain control region are integrally formed with the main body.
17. A contact lithography module, comprising:
a pattern tool carrier including a main body and a pattern tool mounting portion;
a substrate carrier including a main body and a substrate mounting portion; and
at least one spacer located between the pattern tool carrier main body and the substrate carrier main body; and
at least one of means for concentrating deformation-related strain in a portion of the main body in spaced relation to the pattern tool mounting portion and means for concentrating deformation-related strain in a portion of the main body in spaced relation to the substrate mounting portion.
18. A contact lithography module as claimed in claim 17 , wherein the at least one spacer comprises a plurality of spacers.
19. A contact lithography module as claimed in claim 17 , wherein
the pattern tool carrier includes the means for concentrating deformation-related strain in a portion of the main body in spaced relation to the pattern tool mounting portion;
the at least one spacer comprises a plurality of spacers that are associated with the pattern tool carrier; and
the means for concentrating deformation-related strain is located between the spacers and the pattern tool mounting portion.
20. A substrate as claimed in claim 19 , wherein the means for concentrating deformation-related strain is integrally formed with the main body and the pattern tool mounting portion.
21. A contact lithography module as claimed in claim 17 , wherein
the substrate carrier includes the means for concentrating deformation-related strain in a portion of the main body in spaced relation to the substrate mounting portion;
the at least one spacer comprises a plurality of spacers that are associated with the substrate carrier; and
the means for concentrating deformation-related strain is located between the spacers and the substrate mounting portion.
22. A substrate as claimed in claim 21 , wherein the means for concentrating deformation-related strain is integrally formed with the main body and the substrate mounting portion.