IP Library Granted Patent US 7,673,385
Granted Patent B2
US 7,673,385 · App. 11/562,253 · Granted Mar 9, 2010

Laminated structure method

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Quick Facts
Patent No.
US 7,673,385
App. No.
11/562,253
Granted
Mar 9, 2010
Kind
B2
Abstract

A laminated structure having an electrode hard to peel off and a method of manufacturing the laminated structure. The laminated structure has: a backing substrate; a lower electrode including an adhesive layer containing a metal oxide and a conductive layer formed on the backing substrate with the adhesive layer therebetween; a dielectric layer disposed on the lower electrode; and an upper electrode disposed on the dielectric layer. Further, the method includes the steps of: (a) disposing a lower electrode by forming a conductive layer on a backing substrate with an adhesive layer containing a metal oxide therebetween; (b) disposing a dielectric layer by spraying powder of a dielectric material to the lower electrode for deposition; (c) heat-treating the dielectric layer; and (d) forming an upper electrode on the dielectric layer before or after step (c).

Claims (23)

1. A method of manufacturing a laminated structure, said method comprising the steps of:

(a) disposing a first electrode by forming a conductive layer on a backing substrate with an adhesive layer containing a metal oxide therebetween;

(b) disposing a dielectric layer on said first electrode by spraying powder of a dielectric material to said first electrode for deposition;

(c) heat-treating said dielectric layer; and

(d) forming a second electrode on said dielectric layer.

2. A method of manufacturing a laminated structure, said method comprising the steps of:

(a) disposing a first electrode by forming a conductive layer on a backing substrate with an adhesive layer containing a metal oxide therebetween;

(b) disposing a dielectric layer on said first electrode by spraying powder of a dielectric material to said first electrode for deposition;

(c) disposing a second electrode by forming a conductive layer on said dielectric layer with an adhesive layer containing a metal oxide therebetween;

(d) disposing a dielectric layer on said second electrode by spraying powder of a dielectric material to said second electrode for deposition;

(e) heat-treating said dielectric layers; and

(f) forming a third electrode on said dielectric layer disposed at step (d).

3. The method according to claim 2 , further comprising the step of:

repeating steps (c) to (d) for a predetermined number of times.

4. A method of manufacturing a laminated structure, said method comprising the steps of:

(a) disposing a dielectric layer by spraying powder of a dielectric material to a backing substrate for deposition;

(b) disposing a first electrode by forming a conductive layer on said dielectric layer with an adhesive layer containing a metal oxide therebetween;

(c) disposing a dielectric layer on said first electrode by spraying powder of a dielectric material to said first electrode for deposition;

(d) heat-treating said dielectric layers;

(e) forming a second electrode on said second dielectric layer disposed at step (c); and

(f) removing said backing substrate from said dielectric layer.

5. The method according to claim 4 , further comprising the step of:

repeating steps (b) to (c) for a predetermined number of times.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 1, 2008
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 020817/0190 →