Method of forming an organic semiconducting device by a melt technique

1. A method of forming a semiconducting device comprising an organic semiconducting material, the method comprising:

heating a composition comprising the organic semiconducting material to a temperature at or above the melting point or a glass transition temperature of the composition to form a melt; and

cooling the melt to a temperature below the melting point or glass transition temperature of the composition;

wherein the composition further comprises an agent and an additional substance, the agent capable of inhibiting or preventing dewetting, and the additional substance provided in an amount capable of preventing initial crystallization of the composition and reducing the melting point or glass transition temperature of the composition below the melting point or glass transition temperature of the organic semiconducting material, wherein the additional substance comprises naphthalene, phenylnaphthalene, anthrance, or diphenylanthrance.

2. The method of claim 1 , wherein the agent increases the viscosity of the composition and/or melt.

3. The method of claim 1 , wherein the agent increases the affinity of the composition and/or melt to a substrate.

4. The method of claim 1 , wherein the composition comprising the organic semiconducting material is heated in the presence of air and/or light.

5. The method of claim 1 , wherein the composition is in the form of a powder prior to heating.

6. The method of claim 1 , wherein the composition is in the form of a film prior to heating.

7. The method of claim 1 , wherein the melting point or glass transition temperature of the composition is from 100° C. to 1000° C.

8. The method of claim 1 , wherein the melting point or glass transition temperature of the composition is below a decomposition point of the organic semiconducting material.

9. The method of claim 1 , wherein the semiconducting device comprises the organic semiconducting material in the form of a film.

10. The method of claim 9 , wherein the film is at least partially crystalline.

11. The method of claim 1 , wherein the organic semiconducting material comprises a polycyclic fused ring system.

12. The method of claim 11 , polycyclic fused ring system is optionally substituted with one or more groups selected from: aryl; alkynylaryl; C 1 to C 20 alkyl; C 2 to C 20 alkenyl; C 2 to C 20 alkynyl; C 1 to C 20 aralkyl; C 1 to C 20 alkoxy; and —CO 2 —R a2 where R a2 is selected from: C 1 to C 20 unsubstituted alkyl, C 2 to C 20 alkenyl and C 2 to C 20 alkynyl, said one or more aryl and/or alkynylaryl and/or aralkyl groups being optionally substituted on the aromatic ring by one or more groups selected from: halo; phenyl; C 1 to C 20 alkyl; C 2 to C 20 alkenyl; C 2 to C 20 alkynyl; C i to C 20 aralkyl; C 1 to C 20 alkoxy; and —CO 2 —R a3 where R a1 is selected from: C 1 to C 20 unsubstituted alkyl, C 2 to C 20 alkenyl and C 2 to C 20 alkynyl.

13. The method of claim 11 , wherein the organic semiconducting material is a polycyclic fused ring compound selected from a tetraphenyl-naphthacene, optionally substituted with one or more C 1 to C 20 alkyl groups, and a diphenyl-naphthacene, optionally substituted with one or more C 1 to C 20 alkyl groups.

14. The method of claim 1 , wherein the organic semiconducting material is rubrene.

15. The method of claim 1 , wherein the organic semiconducting material is a polymer.

16. The method of claim 1 , further comprising the step of applying the composition comprising the organic semiconducting material onto a substrate or assembly.

17. The method of claim 16 , wherein the substrate or assembly comprises an insulator, a first electrode and a second set of electrodes.

18. A method of forming a semiconducting device comprising an organic semiconducting material, which method comprises:

preparing a solution of a composition comprising the organic semiconducting material in a solvent wherein the composition further comprises an agent and an additional substance, the agent capable of inhibiting and/or preventing dewetting, and the additional substance provided in an amount capable of preventing initial crystallization of the composition and reducing the melting point or glass transition temperature of the composition below the melting point or glass transition temperature of the organic semiconducting material, wherein the additional substance comprises naphthalene, phenylnaphthalene, anthrance, or diphenylanthrance; and

applying the composition to form semiconducting parts of the semiconducting device.

19. The method of claim 18 , wherein the composition comprising the organic semiconducting material is heated in the presence of air and/or light.

20. The method of claim 19 , wherein the composition is in the form of a powder prior to heating.

21. The method of claim 19 , wherein the composition is in the form of a film prior to heating.

22. The method of claim 18 , wherein the melting point or glass transition temperature of the composition is from 100° C. to 1000° C.

23. The method of claim 18 , wherein the device comprises the material in the form of a film.

24. The method of claim 23 , wherein the film is at least partially crystalline.

25. The method of claim 18 , wherein the organic semiconducting material comprises a polycyclic fused ring system.

26. The method of claim 18 , further comprising the step of applying the composition comprising the organic semiconducting material onto a substrate or assembly.

27. The method of claim 26 , wherein the substrate or assembly comprises an insulator, a first electrode and a second set of electrodes.

28. A device comprising an organic semiconducting material obtainable by the method of claim 1 .

29. A device according to claim 28 , which is a field-effect transistor.

30. A method of forming a field-effect transistor comprising:

forming an assembly comprising a first electrode, an insulator, a second set of electrodes and optionally a substrate;

placing a composition comprising an organic semiconducting material onto the assembly;

heating the assembly and/or composition comprising the organic semiconducting material to a temperature at or above the melting point or glass transition temperature of the composition to form a melt;

cooling the melt to a temperature below the melting point or glass transition temperature of the composition;

wherein the composition further comprises an agent and an additional substance, the agent for inhibiting and/or preventing dewetting, and the additional substance provided in an amount capable of preventing initial crystallization of the composition and reducing the melting point or glass transition temperature of the composition below the melting point or glass transition temperature of the organic semiconducting material, wherein the additional substance comprises naphthalene, phenylnaphthalene, anthrance, or diphenylanthrance.

31. The method of claim 1 , wherein the additional substance is a different organic material than the organic material of the composition.

32. The method of claim 31 , wherein the additional substance is 0.01 weight percent to 1 weight percent of the total composition.

33. The method of claim 1 , wherein the additional substance is removed after heating or cooling the melt.

34. The method of claim 18 , wherein the additional substance is a different organic material than the organic material of the composition.

35. The method of claim 34 , wherein the additional substance is 0.01 weight percent to 1 weight percent of the total composition.

36. The method of claim 18 , wherein the additional substance is removed after heating or cooling the melt.

37. The method of claim 30 , wherein the additional substance is a different organic material than the organic material of the composition.

38. The method of claim 37 , wherein the additional substance is 0.01 weight percent to 1 weight percent of the total composition.

39. The method of claim 30 , wherein the additional substance is removed after heating or cooling the melt.