Method for imparting hydrogen resistance to articles
View Patent ↗A simple and low cost method for imparting excellent hydrogen resistance to various types of articles such as a rare earth metal-based permanent magnet. A method for imparting hydrogen resistance to an article of the present invention is characterized by forming a metal coating film by pulse plating on the surface of the article.
1. A method for imparting hydrogen resistance to an article, comprising the step of forming a Cu coating film by pulse plating on the surface of the article,
wherein the Cu coating film is formed by using a plating solution containing from 0.03 mol/L to 1.0 mol/L of copper sulfate, from 0.05 mol/L to 1.5 mol/L of ethylenediaminetetraacetic acid, and from 0.1 mol/L to 1.0 mol/L of at least one selected from tartrates and citrates, with the pH adjusted to a range of from 10.0 to 13.0.
2. The method for imparting hydrogen resistance to an article as claimed in claim 1 , wherein the plating solution further contains from 0.02 mol/L to 1.0 mol/L of sodium sulfate.
3. A method for imparting hydrogen resistance to an article, comprising the step of forming a Cu coating film by pulse plating on the surface of the article,
wherein the Cu coating film is formed by using a plating solution containing from 0.03 mol/L to 1.0 mol/L of copper sulfate, from 0.05 mol/L to 1.5 mol/L of 1-hydroxyethylidene-1,1-diphosphonic acid, and from 0.01 mol/L to 1.5 mol/L of at least one selected from pyrophosphates and polyphosphates, with the pH adjusted to a range of from 8.0 to 11.5.
4. A method for imparting hydrogen resistance to an article, comprising the step of forming a metal coating film by pulse plating on the surface of the article,
wherein an anticorrosive coating film is further formed on the surface of the metal coating film.