IP Library Granted Patent US 7,514,345
Granted Patent B2
US 7,514,345 · App. 11/580,526 · Granted Apr 7, 2009

Electroactive polymers for lithography

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Quick Facts
Patent No.
US 7,514,345
App. No.
11/580,526
Granted
Apr 7, 2009
Kind
B2
Abstract

Systems and methods for lithography include actuating an electroactive polymer member to position mask and/or substrate.

Claims (32)

1. A lithographic method, comprising:

positioning a mask proximate to a substrate; and

shifting the relative position of the mask and the substrate by actuating an electroactive polymer member.

2. The method of claim 1 , further comprising monitoring distances between the mask and the substrate at a plurality of locations, wherein the electroactive polymer member comprises a plurality of separably actuatable active regions, and wherein actuating the electroactive polymer member comprises separately actuating a subset of the separably actuatable active regions in response to the monitored distances.

3. The method of claim 1 , further comprising maintaining a selected distance between the mask and the substrate by using a monitored distance as a feedback signal to adjust a degree of actuation of the electroactive polymer member.

4. The method of claim 1 , wherein shifting the relative position of the mask and the substrate comprises bringing the mask and the substrate into contact.

5. The method of claim 4 , further comprising using a monitored contact force as a feedback signal to adjust a degree of actuation of the electroactive polymer member.

6. The method of claim 4 , further comprising monitoring contact forces at a plurality of locations between the mask and the substrate, wherein the electroactive polymer member comprises a plurality of separably actuatable active regions, and wherein actuating the electroactive polymer member comprises separately actuating a subset of the separably actuatable active regions in response to the monitored contact forces.

7. The method of claim 1 , wherein the electroactive polymer member comprises a plurality of separably actuatable active regions.

8. The method of claim 1 , wherein the change of position or shape of the electroactive polymer member flattens the substrate.

9. The method of claim 8 , further comprising measuring flatness of the substrate, wherein the electroactive polymer member comprises a plurality of separably actuatable active regions, and wherein actuating the electroactive polymer member comprises separately actuating a subset of the separably actuatable active regions in response to the measured flatness of the substrate.

10. The method of claim 1 , wherein the change of position or shape of the electroactive polymer member flattens the mask.

11. The method of claim 10 , further comprising measuring flatness of the mask, wherein the electroactive polymer member comprises a plurality of separably actuatable active regions, and wherein actuating the electroactive polymer member comprises separately actuating a subset of the separably actuatable active regions in response to the measured flatness of the mask.

12. The method of claim 1 , further comprising exposing the substrate to an energy flux through the mask.

13. The method of claim 12 , wherein the substrate is coated with a resist composition, and wherein the energy flux causes a chemical change in the resist composition.

14. The method of claim 1 , further comprising exposing the substrate to an energy flux from the mask.

15. The method of claim 14 , wherein exposing the substrate to the energy flux from the mask comprises applying a voltage to the mask.

16. The method of claim 14 , wherein exposing the substrate to the energy flux from the mask comprises causing the mask to emit light.

17. The method of claim 1 , further comprising causing a physical effect on a surface of the substrate by contact with the mask.

18. The method of claim 17 , wherein chemical composition of the surface is changed by contact with the mask.

19. A method of positioning a mask, comprising:

applying a force with an electroactive polymer.

20. The method of claim 19 , wherein applying a force comprises applying a force to a mask moving mechanism.

21. The method of claim 19 , wherein applying a force comprises deforming the mask.

22. A method of exposing a substrate, comprising:

shifting the relative position of a mask and the substrate by actuating an electroactive polymer member; and

exposing the substrate to an energy flux through the mask.

23. A method of exposing a substrate, comprising:

shifting the relative position of a mask and the substrate by actuating an electroactive polymer member; and

exposing the substrate to an energy flux from the mask.

24. The method of claim 23 , wherein exposing the substrate to an energy flux from the mask comprises applying a voltage to the mask.

25. The method of claim 23 , wherein exposing the substrate to an energy flux from the mask comprises inducing the mask to emit light.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2023
From: DEEP SCIENCE LLC
To: ENTERPRISE SCIENCE FUND, LLC
Reel/Frame 064924/0296 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2016
From: THE INVENTION SCIENCE FUND I, LLC
To: DEEP SCIENCE, LLC
Reel/Frame 037540/0628 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2009
From: SEARETE LLC
To: INVENTION SCIENCE FUND I
Reel/Frame 023484/0690 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 14, 2006
From: HYDE, RODERICK A.; MYHRVOLD, NATHAN P.
To: SEARETE LLC
Reel/Frame 018726/0966 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 17, 2006
From: HYDE, RODERICK; MYHRVOLD, NATHAN P.
To: SEARETE LLC
Reel/Frame 018601/0522 →