Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use therein
The present invention is directed to a composition consisting essentially of: a) from about 80 to about 99 mole % of TiO 2 , and b) from about 1 to about 20 mole % of one or more materials selected from the group consisting of i) WO 2 , ii) Ta 2 O 5 , iii) Nb 2 O 5 , iv) MoO 2 , v) Mo, vi) Ta, vii) Nb, viii) W and ix) mixtures thereof, wherein the mole % s are based on the total product and wherein the sum of components a) and b) is 100. The invention is also directed to the sintered product of such composition, a sputtering target made from the sintered product and a transparent electroconductive film made from the composition.
1 . A composition consisting essentially of:
a) from about 80 to about 99 mole % of TiO 2 , and
b) from about 1 to about 20 mole % of one or more materials selected from the group consisting of
i) WO 2 ,
ii) Ta 2 O 5 ,
iii) Nb 2 O 5 ,
iv) MoO 2 ,
v) Mo,
vi) Ta,
vii) Nb,
viii) W and
ix) mixtures thereof,
wherein the mole % s are based on the total product and wherein the sum of components a) and b) is 100.
2 . The composition of claim 1 wherein component a comprises from about 90 to about 99 mole % and component b) comprises from about 1 to about 10 mole %.
3 . The composition of claim 1 , wherein component b) is WO 2 .
4 . The composition of claim 1 wherein component b) is Ta 2 O 5 .
5 . A sintered product prepared by sintering the composition of claim 1 .
6 . A sputtering target comprising the product prepared by sintering the composition of claim 1 .
7 . A transparent electroconductive film prepared by forming on the surface of a substrate, a transparent electroconductive layer of a composition consisting essentially of the composition of claim 1 .