Methods for selective deposition of graded materials on continuously fed objects
View Patent ↗Embodiments of the invention include a selective deposition method that allows for coating of selective portions of an object, such as an electronic device, and inhibits coating of other selective portions of the object, such as the electric contacts. The selective deposition method includes providing a web to transport the object through a deposition chamber. The web may include and reference mechanisms to register the object relative to the web. The method further includes providing deposition material and a shadow mask that has open spaces in it to inhibit coating selective portions of the object. The deposition material serves as the coating material.
1. A method for inhibiting coating selective portions of an object, comprising:
providing a web upon which the object is placed, the web including a plurality of openings to allow a deposition material to coat selective portions of the object and inhibit coating of selective portions of the object;
transporting the object through a deposition chamber comprising a first chamber area separated from a second chamber area by a baffle having an adjustable opening for controlling a migration rate of the deposition material through said opening; and
providing the deposition material to serve as a coating.
2. The method of claim 1 , comprising registering the object relative to the web to ensure the selective portions of the object remain uncoated.
3. The method of claim 2 , wherein said registering comprises providing reference markers on the object and the web serving as the shadow mask.
4. The method of claim 3 , wherein said providing reference markers comprises providing reference pins on the object and reference slots on the web serving as the shadow mask.
5. The method of claim 3 , wherein said providing reference markers comprises providing autocalibration markers on the web serving as the shadow mask and complementary markers on the object.
6. The method of claim 1 , wherein said providing a deposition material comprises producing a graded barrier coating.
7. The method of claim 1 , wherein said providing a deposition material comprises producing a hard coating capable of protecting the object from at least one of ultraviolet radiation, physical damage, or chemical damage.
8. The method of claim 1 , wherein said providing a deposition material comprises plasma-enhanced chemical-vapor deposition, radio-frequency plasma-enhanced chemical-vapor deposition, expanding thermal-plasma chemical-vapor deposition, sputtering including reactive sputtering, electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition, inductively coupled plasma-enhanced chemical-vapor deposition, evaporation, atomic layer deposition, or combinations thereof.