Method of measuring degree of crystallinity of polycrystalline silicon substrate, method of fabricating organic light emitting display using the same, and organic light emitting display fabricated using the same

1. A method of measuring a degree of crystallinity of a polycrystalline silicon substrate, the method comprising:

obtaining a Raman spectrum graph by irradiating a polycrystalline silicon substrate with monochromatic light;

deconvolving the Raman spectrum graph into a peak corresponding to amorphous silicon and having a center at 480 cm −1 and a peak corresponding to polycrystalline silicon and having a center at 517 cm −1 ;

calculating the peak area of the amorphous silicon and the peak area of the polycrystalline silicon from data obtained during the deconvolving of the Raman spectrum graph; and

calculating a degree of crystallinity of the polycrystalline silicon substrate using the calculated peak area of the amorphous silicon and the calculated peak area of the polycrystalline silicon from the Raman spectrum graph in the following formula:

(degree of crystallinity)=(peak area of polycrystalline silicon)/[(peak area of amorphous silicon)+(peak area of polycrystalline silicon)].

2. The method of claim 1 , wherein the monochromatic light is a laser beam.

3. The method of claim 1 , further comprising:

determining that the polycrystalline silicon substrate is acceptable for use in fabricating a thin film transistor if the calculated degree of crystallinity of the polycrystalline silicon substrate exceeds a predetermined degree of crystallinity; and

determining that the polycrystalline silicon substrate is not acceptable for use in fabricating a thin film transistor if the calculated degree of crystallinity of the polycrystalline silicon substrate does not exceed the predetermined degree of crystallinity.

4. The method of claim 3 , wherein the predetermined degree of crystallinity is 70%.

5. A method of fabricating an organic light emitting display, the method comprising:

fabricating a polycrystalline silicon substrate by crystallizing an amorphous silicon substrate;

obtaining a Raman spectrum graph by irradiating the polycrystalline silicon substrate with monochromatic light;

deconvolving the Raman spectrum graph into a peak corresponding to amorphous silicon and having a center at 480 cm −1 and a peak corresponding to polycrystalline silicon and having a center at 517 cm −1 ;

calculating a peak area of the amorphous silicon and a peak area of the polycrystalline silicon from the data obtained during the deconvolving of the Raman spectrum graph; and

calculating the degree of crystallinity using the calculated peak area of the amorphous silicon and the calculated peak area of the polycrystalline silicon in the following formula:

(degree of crystallinity)=(peak area of polycrystalline silicon)/[(peak area of amorphous silicon)+(peak area of polycrystalline silicon)]; and

fabricating a thin film transistor using the polycrystalline silicon substrate depending on a result of the examining of the degree of crystallinity of the polycrystalline silicon substrate.

6. The method of claim 5 , wherein the fabricating of the thin film transistor using the polycrystalline silicon substrate is performed only if the degree of crystallinity of the polycrystalline silicon substrate is determined to be 70% or more in the examining of the degree of crystallinity of the polycrystalline silicon substrate.

7. The method of claim 5 , wherein the fabricating of the polycrystalline silicon substrate comprises crystallizing the amorphous silicon substrate using a solid phase crystallization (SPC) method, an excimer laser annealing (ELA) method, a metal induced crystallization (MIC) method, a metal induced lateral crystallization (MILC) method, or a sequential lateral solidification (SLS) method.

8. The method of claim 7 , wherein the fabricating of the thin film transistor using the polycrystalline silicon substrate is performed only if the degree of crystallinity of the polycrystalline silicon substrate is determined to be 70% or more in the examining of the degree of crystallinity of the polycrystalline silicon substrate.

9. The method of claim 5 , wherein the monochromatic light is a laser beam.

10. The method of claim 5 , wherein the fabricating of the thin film transistor using the polycrystalline silicon substrate is performed only if the degree of crystallinity of the polycrystalline silicon substrate is determined to exceed a predetermined degree of crystallinity in the examining of the degree of crystallinity of the polycrystalline silicon substrate.