Method for creating observational sample
View Patent ↗According to the present invention, a method for creating a sample for a TEM (Transmission Electron Microscope) observation comprising: forming an observation surface at a specific area of a semiconductor device; forming an amorphous protection film on the observation surface; and thinning a portion of the semiconductor device including at least the protection film.
1. A method for creating a sample for a TEM (Transmission Electron Microscope) observation comprising:
forming an observation surface at a specific area of a semiconductor device;
forming an amorphous protection film on the observation surface; and
thinning a portion of the semiconductor device including at least the protection film.
2. A method for creating a sample for a TEM observation according to claim 1 , further comprising
forming a cavity to surround the observation surface before the thinning step.
3. A method for creating a sample for a TEM observation according to claim 1 , wherein
the thinning step comprises a step for removing an deposition put on the protection film so that the protection film is remained.
4. A method for creating a sample for a TEM observation according to claim 1 , wherein
the protection film is of a carbon film or a silicon oxide film.
5. A method for creating a sample for a TEM observation according to claim 1 , wherein
the protection film is formed on the observation surface by a deposition process using focused ion beams or electron beams.
6. A method for creating a sample for a TEM observation according to claim 2 , wherein
the cavity surrounding the observation surface is formed by a process using focused ion beams.