IP Library Granted Patent US 7,655,199
Granted Patent B2
US 7,655,199 · App. 11/604,967 · Granted Feb 2, 2010

Process for uranium recovery using anion exchange resin

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Quick Facts
Patent No.
US 7,655,199
App. No.
11/604,967
Granted
Feb 2, 2010
Kind
B2
Abstract

The present invention relates to a process for the recovery of uranium in high silica environments comprising the use of a strong base macroreticular ion exchange resin.

Claims (15)

1. A process comprising:

a) obtaining a uranium and silica containing sample;

b) leaching the uranium and silica containing sample to form a leachate wherein the leachate contains

(i) greater than or equal to 100 mg SiO 2 /liter; and

(ii) dissolved uranium

b) removing the dissolved uranium from the material using at least one strong base macroreticular anion exchange resin to obtain a uranium product in combination with the strong base macroreticular anion exchange resin; and

c) eluting and recovering the uranium product from the combination in step b).

2. The process of claim 1 wherein the dissolved uranium is obtained by leaching the uranium and silica containing sample with sulfuric acid.

3. The process of claim 1 wherein the composition of the strong base macroreticular ion exchange resin comprises styrene-divinylbenzene containing functional quaternized ammonium groups.

4. The process of claim 1 wherein the strong base macroreticular anion exchange resin has a porosity of from 0.15 to 0.50 ml/ml.

5. The process of claim 1 wherein the strong base macroreticular anion exchange resin has an average pore diameter from 100 to 400 Angstroms.

6. The process of claim 1 wherein the uranium product is eluted with at least one agent selected from the following: ammonium nitrate, sodium chloride or sulfuric acid.

7. The process of claim 1 wherein the uranium product is recovered by precipitation extraction in step c).

8. The process of claim 1 wherein the uranium product is recovered by solvent extraction followed by precipitation extraction.

9. The process of claim 1 wherein the leachate contains from 100 to 3000 mg SiO 2 /liter.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 10, 2024
From: ROHM AND HAAS COMPANY
To: DDP SPECIALTY ELECTRONIC MATERIALS US 8, LLC
Reel/Frame 068908/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 16, 2009
From: CABLE, PETER IAN; ZAGANIARIS, EMMANUAL
To: ROHM AND HAAS COMPANY
Reel/Frame 023703/0107 →