Solid-state imaging device, solid-state imaging apparatus and methods for manufacturing the same

To arrange diffusion-inhibitory films 5 a , 5 b , and 5 c for inhibiting the diffusion of a wiring material absent in a region on or above a light receiving unit 2 , the diffusion-inhibitory films 5 a , 5 b , and 5 c formed on a region above the light receiving unit 2 are selectively removed. Alternatively, the diffusion-inhibitory films are arranged only on top surfaces of wirings 4 a , 4 b , and 4 c , and only a passivation film 12 and interlayer insulating films 3 a , 3 b , and 3 c are arranged in the region on or above the light receiving unit 2 . Thus, with less interface between different insulation films and less reflection of incident light in an incident region, the incident light 13 highly efficiently passes through these insulating films and comes into the light receiving unit 2 . The light receiving unit 2 can thereby receive a sufficient quantity of the incident light 13.