IP Library Granted Patent US 8,114,262
Granted Patent B2
US 8,114,262 · App. 11/621,890 · Granted Feb 14, 2012

Thickness distribution control for electroplating

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Quick Facts
Patent No.
US 8,114,262
App. No.
11/621,890
Granted
Feb 14, 2012
Kind
B2
Abstract

The invention is directed to an assembly for electroplating comprising an electroplating bath and non-conductive plates. The invention is also directed to an assembly for electroplating comprising an electroplating bath, elements with electrically adjustable resistance, and ampere-hour meters. The invention is further directed to methods for monitoring, controlling and adjusting the thickness distribution of an electroplated material on an object. The object can be of any shape as long as it can electrically charged.

Claims (10)

1. A method for monitoring, controlling and adjusting the thickness distribution of an electroplated material on an object in an electroplating process, which method comprises:

a) immersing in an electroplating bath multiple anodes and an object to be electroplated and to act as a cathode;

b) providing

(i) elements with electrically adjustable resistance,

(ii) ampere-hour meters each of which is in serial connection with one of said anodes and one of said elements with electrically adjustable resistance, wherein each of said ampere-hour meters measures and records the deposition and thickness of the electroplated material in an area on the object which faces the anode to which said ampere-hour meter is connected; and

(iii) a controller connected to said elements with electrically adjustable resistance and said ampere-hour meters;

c) providing compiled deposition data by the ampere-hour meters to the controller; and

d) sending signals from the controller to the elements with electrically adjustable resistance based on the difference between the compiled data and the desired thickness distribution, to monitor, control, and adjust the thickness distribution of the electroplated material on the object.

2. The method of claim 1 wherein each of said elements with electrically adjustable resistance is located between one of said anodes and one of said ampere-hour meters.

3. The method of claim 1 wherein said element with electrically adjustable resistance is a rheostat or variable resistor.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 5, 2023
From: E INK CALIFORNIA, LLC
To: E INK CORPORATION
Reel/Frame 065154/0965 →
CHANGE OF NAME Recorded Jul 7, 2014
From: SIPIX IMAGING, INC.
To: E INK CALIFORNIA, LLC
Reel/Frame 033280/0408 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2007
From: KANG, GARY YIH-MING; CHAUG, YI-SHUNG
To: SIPIX IMAGING, INC.
Reel/Frame 019114/0872 →