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App. No. 11/624,544 · Confirmation No. 6830

METHOD FOR CORRECTING PHOTOMASK PATTERN

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2009-10-23 ABN Abandonment 2 View
2009-03-02 CTNF Non-Final Rejection 2 View
2009-03-02 CTNF Non-Final Rejection 10 View
2009-03-02 892 List of references cited by examiner 2 View
2009-03-02 FWCLM Index of Claims 1 View
2009-03-02 SRFW Search information including classification, databases and other search related notes 1 View
2009-03-02 BIB Bibliographic Data Sheet 1 View
2009-03-02 SRNT Examiner's search strategy and results 3 View
2009-03-02 1449 List of References cited by applicant and considered by examiner 1 View
2008-07-24 NTC.PUB Notice of Publication 1 View
2007-02-13 APP.FILE.REC Filing Receipt 3 View
2007-01-18 ADS Application Data Sheet 5 View
2007-01-18 OATH Oath or Declaration filed 2 View
2007-01-18 SPEC Specification 16 View
2007-01-18 CLM Claims 4 View
2007-01-18 ABST Abstract 1 View
2007-01-18 DRW Drawings-only black and white line drawings 9 View
2007-01-18 IDS Information Disclosure Statement (IDS) Form (SB08) 4 View
2007-01-18 WFEE Fee Worksheet (SB06) 2 View
2007-01-18 N417 Electronic Filing System Acknowledgment Receipt 3 View
2007-01-18 136A Authorization for Extension of Time all replies 3 View
2007-01-18 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
11/624,544
Filed
2007-01-18
Pub. No.
US20080178140A1
Art Unit
2825