Percutaneous spinal implants and methods
A method includes moving a spinal implant such that a central portion of the spinal implant is disposed between adjacent spinous processes, radially extending a proximal portion of the spinal implant on a first side of the adjacent spinous processes such that movement of the proximal portion between the adjacent spinous processes is inhibited, and radially extending a distal portion of the spinal implant on a second side of the adjacent spinous processes opposite the first side such that movement of the distal portion between the adjacent spinous processes is inhibited.
1. A method, comprising:
moving a spinal implant such that a distal end of the implant is disposed on a first lateral side of adjacent spinous processes, a central exterior portion of the spinal implant is disposed between adjacent spinous processes and extends through a sagittal plane defined by the adjacent spinous processes, and a proximal end of the implant is disposed on a second lateral side of adjacent spinous processes; the first lateral side being opposite the second lateral side;
radially extending a first portion of the spinal implant on the first side of the adjacent spinous processes, wherein the first portion is disposed more proximally than the distal end of the implant;
radially extending a second portion of the spinal implant on the second side of the adjacent spinous processes, wherein the second portion is disposed more distally than the proximal end of the implant;
wherein the central exterior portion longitudinally separates the first and second portions; and wherein a height of the central exterior portion does not substantially increase as the first and second portions are radially extended; the height being measured in a direction from a superior surface of one of the spinous processes to an inferior surface of the other of the spinous processes in the sagittal plane;
wherein, when the first and second portions are radially extended, the first and second portions are disposed on opposing lateral sides of the spinous processes such that neither the first portion nor the second portion extends through the sagittal plane defined by the adjacent spinous processes.
2. The method of claim 1 wherein the radially extending the second portion includes moving the proximal end of the implant closer towards the central portion of the implant.
3. The method of claim 1 wherein the radially extending the first portion includes moving the distal end of the implant closer towards the central portion of the implant.
4. The method of claim 1 wherein the second portion includes a plurality of expanding members; wherein radially extending the second portion includes radially extending the plurality of expanding members on the second side of the adjacent spinous processes.
5. The method of claim 1 wherein the steps of radially extending the first portion and radially extending the second portion are performed sequentially.
6. The method of claim 1 wherein the steps of radially extending the first portion and radially extending the second portion are performed simultaneously.
7. The method of claim 1 , further comprising:
inserting an actuator into the spinal implant before the moving the spinal implant.
8. The method of claim 1 , further comprising:
forming a percutaneous access path to a location between the adjacent spinous processes before the moving the spinal implant.
9. A method, comprising:
disposing a spinal implant between adjacent spinous processes and extends through a sagittal plane defined by the adjacent spinous processes while the spinal implant is in a first configuration;
deforming the spinal implant from the first configuration to a second configuration, the implant in the second configuration having a first set of extendible members extending along the adjacent spinous processes on a first lateral side of the sagittal plane and a second set of extendible members extending along the adjacent spinous processes on a second lateral side of the sagittal plane;
wherein a central portion of the implant longitudinally separates the first and second sets of extendible members;
wherein each of the first set of extendible members has a tip being a portion of the corresponding extendible member that extends farthest from a longitudinal axis of the implant; wherein the tips are angularly offset from one another and lie in a common plane disposed generally perpendicular to the longitudinal axis.
10. The method of claim 9 , wherein the deforming the spinal implant includes deforming a first portion of the spinal implant and a second portion of the implant, leaving a third portion of the spinal implant substantially non-deformed.
11. The method of claim 9 wherein the deforming the spinal implant causes the plurality of extendible portions to move radially outwardly from the longitudinal axis of the spinal implant.
12. The method of claim 9 , wherein the plurality of extendible portions are equidistant from one another.
13. A method, comprising:
placing an implant between two adjacent spinous processes to extend through a sagittal plane defined by the spinous processes such that a distal end of the implant is disposed on a first lateral side of the spinous processes and a proximal end of the implant is disposed on a second lateral side of the spinous processes, wherein the implant comprises a tubular structure;
deforming a first expanding member of the implant on a first side of the adjacent spinous processes, wherein the first expanding member is disposed more distally than the proximal end of the implant;
deforming a second expanding member of the implant on a second side of the adjacent spinous processes, wherein the second expanding member is disposed more proximally than the distal end of the implant;
wherein a central exterior portion longitudinally separates the first and second expanding members; and wherein a height of the central exterior portion does not substantially increase as the first and second portions are deformed; the height being measured in a direction from a superior surface of one of the spinous processes to an inferior surface of the other of the spinous processes in the sagittal plane;
wherein when the first and second expanding members are deformed, the first and second expanding members are disposed on opposing lateral sides of the spinous processes such that neither expanding member extends through the sagittal plane defined by the adjacent spinous processes.
14. The method of claim 13 , wherein the tubular structure being fabricated from a continuous piece of material.
15. The method of claim 13 , wherein the tubular structure being fabricated from a continuous piece of metal.
16. The method of claim 13 , wherein the implant further comprises a core positioned in a lumen of the tubular structure.