IP Library Granted Patent US 7,381,342
Granted Patent B2
US 7,381,342 · App. 11/635,524 · Granted Jun 3, 2008

Method for manufacturing an inkjet nozzle that incorporates heater actuator arms

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Quick Facts
Patent No.
US 7,381,342
App. No.
11/635,524
Granted
Jun 3, 2008
Kind
B2
Abstract

A method is provided for manufacturing an inkjet nozzle. The method includes the step of depositing a plastics material layer on a substrate incorporating heater actuator circuitry. The plastics material layer is etched to form a nozzle rim defining an ink port through which ink can be ejected and a plurality of elongate actuator arms extending radially with respect to the nozzle rim. A tapered ink chamber may be etched in the nozzle body so that the ink port and ink chamber are in fluid communication with each other.

Claims (9)

1. A method for manufacturing an inkjet nozzle, the method comprising the steps of:

depositing a plastics material layer on a substrate incorporating heater actuator circuitry; and

etching the plastics material layer to form a nozzle rim defining an ink ejection port through which ink can be ejected and a plurality of elongate actuator arms extending radially with respect to the nozzle rim, such that each actuator arm incorporates heater actuator circuitry.

2. A method as claimed in claim 1 , which includes the step of etching a tapered ink chamber in the substrate so that the ink port and ink chamber are in fluid communication with each other.

3. A method as claimed in claim 2 , which includes the step of etching an ink supply inlet in the substrate at an apex of the tapered ink chamber, the ink supply inlet being in fluid communication with the ink chamber.

4. A method as claimed in claim 3 wherein, prior to the step of depositing the plastics material, the method further includes the steps of depositing a metal layer on the substrate and etching the metal layer to define the heater actuator circuitry.

5. A method as claimed in claim 4 , wherein the metal layer is deposited in a recess etched in the substrate.

6. A method as claimed in claim 1 , wherein a semiconductor wafer and one or more metal layers are formed on the substrate.

7. A method as claimed in claim 1 , wherein the plastic material layer includes polytetrafluoroethylene (PTFE).

Assignments (2)
CHANGE OF NAME Recorded Jun 25, 2014
From: ZAMTEC LIMITED
To: MEMJET TECHNOLOGY LIMITED
Reel/Frame 033244/0276 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 17, 2012
From: SILVERBROOK RESEARCH PTY. LIMITED AND CLAMATE PTY LIMITED
To: ZAMTEC LIMITED
Reel/Frame 028568/0304 →