Thin film preparation apparatus
A thin film preparation apparatus performs film formation by supplying a precursor CuCl with increased supply accuracy and Cl* from a material supply apparatus outside a chamber into the chamber with the use of a member to be etched, which has been temperature-controlled independently, and depositing a Cu component of the CuCl on a substrate, without complicating temperature control (simply by heating control by a heater), and without the influence of radiation from a plasma.
1 . A material supply apparatus, connected to a chamber accommodating a substrate, for supplying a gas serving as a material for a thin film into the chamber, the material supply apparatus comprising:
a member to be etched, the member being formed of a material containing an element capable of forming at least one high vapor pressure halide;
heating means for heating the member, to be etched, to a predetermined temperature; and
a material passage for bringing a halogen gas into contact with the member to be etched, which has been heated to the predetermined temperature, to form a gas of a precursor as a compound of the element and a halogen, and supplying the gas into the chamber.
2 . A material supply apparatus, connected to a chamber accommodating a substrate, for supplying a gas serving as a material for a thin film into the chamber, and supplying radicals for deposition of the thin film into the chamber, the material supply apparatus comprising:
a member to be etched, the member being formed of a material containing an element capable of forming at least one high vapor pressure halide;
heating means for heating the member, to be etched, to a predetermined temperature;
a material passage for bringing a halogen gas into contact with the member to be etched, which has been heated to the predetermined temperature, to form a gas of a precursor as a compound of the element and a halogen, and supplying the gas into the chamber; and
a radical passage for bringing the halogen gas into contact with the heating means to obtain halogen gas radicals, and supplying the halogen gas radicals into the chamber.
3 . The material supply apparatus according to claim 2 , further comprising:
an outer cylinder for forming the radical passage;
a concentric inner cylinder provided on an inner periphery of the outer cylinder;
a hot wire provided as heating means between the outer cylinder and the inner cylinder; and
the member to be etched, the member being formed in a tubular shape on an inner periphery of the inner cylinder, and
wherein the halogen gas is supplied to a space between the outer cylinder and the inner cylinder and to an interior of the inner cylinder, whereby the inner cylinder supplying the gas of the precursor into the chamber serves as the material passage, and the space between the outer cylinder and the inner cylinder supplying the halogen gas radicals into the chamber serves as the radical passage.
4 . The material supply apparatus according to claim 3 , further comprising:
a concentric second outer cylinder provided on an outer periphery of the outer cylinder; and
a working gas radical passage, defined between the outer cylinder and the second outer cylinder, for flowing a working gas to obtain working gas radicals, and supplying the working gas radicals into the chamber.
5 . The material supply apparatus according to claim 3 , further comprising:
a concentric second outer cylinder provided on an outer periphery of the outer cylinder;
a second member to be etched, the second member being provided between the outer cylinder and the second outer cylinder and formed of a material containing an element capable of forming at least one high vapor pressure halide; and
a second material passage for bringing a halogen gas into contact with the second member to be etched, which has been heated to the predetermined temperature, to form a gas of a precursor as a compound of the element and a halogen, and supplying the gas into the chamber, the second material passage being defined between the outer cylinder and the second outer cylinder.
6 . A thin film preparation apparatus, comprising:
a tubular chamber accommodating a substrate;
the material supply apparatus according to claim 1;
halogen radical generation means for generating halogen radicals within the chamber; and
temperature control means for controlling a temperature of the substrate to a relatively low predetermined temperature to adsorb the gas of the precursor from the material supply apparatus to the substrate, and allow the halogen radicals to act on the precursor kept adsorbed to the substrate, thereby reducing the precursor to deposit the element as a component of the precursor on the substrate for performing predetermined film formation.
7 . A thin film preparation apparatus, comprising:
a tubular chamber accommodating a substrate;
the material supply apparatus according to claim 2; and
temperature control means for controlling a temperature of the substrate to a relatively low predetermined temperature to adsorb the gas of the precursor from the material supply apparatus to the substrate, and allow the halogen radicals to act on the precursor kept adsorbed to the substrate, thereby reducing the precursor to deposit the element as a component of the precursor on the substrate for performing predetermined film formation.
8 . A thin film preparation apparatus, comprising:
a tubular chamber accommodating a substrate;
the material supply apparatus according to claim 3; and
temperature control means for controlling a temperature of the substrate to a relatively low predetermined temperature to adsorb the gas of the precursor from the material supply apparatus to the substrate, and allow the halogen radicals to act on the precursor kept adsorbed to the substrate, thereby reducing the precursor to deposit the element as a component of the precursor on the substrate for performing predetermined film formation.
9 . The thin film preparation apparatus according to claim 6 , further comprising a plurality of the material supply apparatuses.
10 . The thin film preparation apparatus according to claim 7 , further comprising a plurality of the material supply apparatuses.
11 . The thin film preparation apparatus according to claim 8 , further comprising a plurality of the material supply apparatuses.
12 . The thin film preparation apparatus according to claim 7 , further comprising:
plural pairs of the material supply apparatuses; and
control means for rendering element components of the member to be etched in the respective pairs different, and selectively supplying the halogen gas to the respective pairs independently of each other pair to deposit the different element components in a stacked state on the substrate.
13 . The thin film preparation apparatus according to claim 8 , further comprising:
plural pairs of the material supply apparatuses; and
control means for rendering element components of the member to be etched in the respective pairs different, and selectively supplying the halogen gas to the respective pairs independently of each other pair to deposit the different element components in a stacked state on the substrate.
14 . The thin film preparation apparatus according to claim 7 , further comprising:
plural pairs of the material supply apparatuses; and
control means for rendering element components of the member to be etched in the respective pairs different, and supplying the halogen gas to the respective pairs in supply amounts independent of each other pair to deposit the different element components in graded proportions on the substrate.
15 . The thin film preparation apparatus according to claim 8 , further comprising:
plural pairs of the material supply apparatuses; and
control means for rendering element components of the member to be etched in the respective pairs different, and supplying the halogen gas to the respective pairs in supply amounts independent of each other pair to deposit the different element components in graded proportions on the substrate.