Transflective type liquid crystal display device and a method for fabricating the same
View Patent ↗A transflective type LCD device includes a substrate, gate and data lines perpendicularly arranged to each other to define unit pixel regions each including transmitting and reflective parts, a plurality of thin film transistors formed adjacent to crossing portions of the gate and data lines, a passivation layer formed on the substrate including the thin film transistors, a plurality of pixel electrodes formed on the passivation layer in each unit pixel region, a plurality of first reflective plates electrically connected with the pixel electrodes and formed in the reflective parts, and second reflective plates formed on a predetermined portions of the substrate corresponding to the boundaries between the transmitting parts and the reflective parts.
1. A transflective type LCD device comprising:
a substrate;
gate and data lines perpendicularly arranged to each other on the substrate to define unit pixel regions each including transmitting and reflective parts;
a plurality of thin film transistors formed adjacent to crossing portions of the gate and data lines;
a passivation layer formed on the substrate including the thin film transistors;
a plurality of pixel electrodes formed on the passivation layer in each unit pixel region;
a plurality of first reflective plates electrically connected with the pixel electrodes and formed in the reflective parts; and
a plurality of second reflective plates formed on a predetermined portions of the substrate corresponding to the boundaries between the transmitting parts and the reflective parts.
2. The transflective type LCD device of claim 1 , wherein the first reflective plates are formed above the pixel electrodes.
3. The transflective type LCD device of claim 2 , wherein each pixel electrode is electrically connected with a drain electrode of the thin film transistor.
4. The transflective type LCD device of claim 1 , wherein the first reflective plates are formed beneath the pixel electrodes.
5. The transflective type LCD device of claim 4 , wherein each first reflective plate is electrically connected with a drain electrode of the thin film transistor.
6. The transflective type LCD device of claim 1 , wherein the second reflective plates are formed on the same layer as gate electrodes of the thin film transistors.
7. The transflective type LCD device of claim 1 , wherein the passivation layer is formed only in the reflective parts.
8. The transflective type LCD device of claim 1 , wherein the passivation layer is formed of an organic insulation material.
9. The transflective type LCD device of claim 1 , wherein the first and second reflective plates are formed of aluminum (Al), aluminum neodymium (AlNd), or copper (Cu).
10. The transflective type LCD device of claim 1 , further comprising a polarizing plate adhered to the rear surface of the substrate.
11. The transflective type LCD device of claim 1 , further comprising a wavelength plate inserted and adhered between a polarizing plate and the rear surface of the substrate.
12. A method for fabricating a transflective type LCD device, comprising:
forming gate and data lines perpendicular to each other on a substrate to define unit pixel regions each including transmitting and reflective parts;
forming a plurality of thin film transistors adjacent to crossing portions of the gate and data lines;
forming a passivation layer on the substrate including the thin film transistors;
forming a plurality of pixel electrodes on the passivation layer in each unit pixel region;
forming a plurality of first reflective plates on the pixel electrodes of the reflective parts; and
forming a plurality of second reflective plates on predetermined portions of the substrate corresponding to the boundaries between the transmitting and reflective parts.
13. The method of claim 12 , further comprising selectively removing the passivation layer from the transmitting parts.
14. The method of claim 12 , wherein the second reflective plates are formed on the same layer as gate electrodes of the thin film transistors.
15. A method for fabricating a transflective type LCD device, comprising:
forming gate and data lines perpendicular to each other on a substrate, to thereby define unit pixel regions each including transmitting and reflective parts;
forming a plurality of thin film transistors adjacent to crossing portions of the gate and data lines;
forming a passivation layer on the substrate including the thin film transistors;
forming a plurality of first reflective plates on the passivation layer of the reflective parts;
forming a plurality of pixel electrodes in the unit pixel regions to electrically connect with the first reflective plates; and
forming a plurality of second reflective plates on predetermined portions of the substrate corresponding to the boundaries between the transmitting and reflective parts.
16. The method of claim 15 , further comprising selectively removing the passivation layers from the transmitting parts.
17. The method of claim 15 , wherein the second reflective plates are formed on the same layer as gate electrodes of the thin film transistors.