Liquid crystal display device having a pixel electrode pattern formed by using an alignment layer pattern as the mask and method for manufacturing the same

1. A method for manufacturing an LCD device comprising:

forming an electrode layer for a pixel electrode on a first substrate;

forming a predetermined alignment layer pattern for an initial alignment of a liquid crystal on the electrode layer,

wherein forming the predetermined alignment layer pattern includes:

forming a photo-reactive polymer layer on the electrode layer;

applying light to the photo-reactive polymer layer using a predetermined mask pattern; and

forming the predetermined alignment layer pattern by developing the photo-reactive polymer layer to which light is applied;

removing portions of the alignment layer pattern in an area corresponding only to a light shielding layer formed on a second substrate opposite to the first substrate and a gate electrode on the first substrate, wherein a top surface of the electrode layer is exposed; and

forming a pixel electrode pattern in a same pattern as the alignment layer pattern and a passivation layer in the same pattern as the pixel electrode pattern by patterning the exposed electrode layer and the entire passivation layer directly below the exposed electrode layer using the alignment layer pattern as a mask.

2. The method of claim 1 , further comprising:

rubbing the alignment layer pattern after forming the pixel electrode pattern.

3. The method of claim 1 , further comprising:

forming a thin film transistor on the first substrate before forming the electrode layer.

4. The method of claim 3 , wherein forming of the thin film transistor includes:

forming a buffer layer on an entire surface of the first substrate;

forming an active layer on the buffer layer;

forming a gate insulating layer on the entire surface of the first substrate including the active layer;

forming the gate electrode on the gate insulating layer;

forming an insulating interlayer on the entire surface of the first substrate including the gate electrode;

forming a contact hole in a predetermined portion of the gate insulating layer and insulating interlayer;

forming source and drain electrodes connected with the active layer through the contact hole; and

forming the passivation layer on the entire surface of the first substrate including the source and drain electrodes, the passivation layer having a contact hole in a predetermined portion thereof.

5. The method of claim 1 , further comprising:

preparing the second substrate; and

forming a liquid crystal layer between the first and second substrates.

6. The method of claim 5 , wherein the preparing of the second substrate includes:

forming a color filter layer on the light-shielding layer;

forming a common electrode on the color filter layer; and

forming an alignment layer on the common electrode.

7. The method of claim 5 , wherein the forming of the liquid crystal layer between the first and second substrates includes:

forming a sealant having an inlet in one of the first and second substrates;

bonding the first and second substrates to each other; and

injecting liquid crystal into a space between the first and second substrates through the inlet.

8. The method of claim 5 , wherein the forming of the liquid crystal layer between the first and second substrates includes:

forming a sealant having no inlet in any one of the first and second substrates;

dispensing liquid crystal onto any one of the first and second substrates; and

bonding the first and second substrates to each other.