IP Library Granted Patent US 7,612,387
Granted Patent B2
US 7,612,387 · App. 11/639,754 · Granted Nov 3, 2009

Thyristor optimized for a sinusoidal HF control

Assignee: STMicroelectronics S.A.
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Quick Facts
Patent No.
US 7,612,387
App. No.
11/639,754
Granted
Nov 3, 2009
Kind
B2
Abstract

A vertical thyristor adapted to an HF control, including a cathode region in a P-type base well, a lightly-doped P-type layer next to the base well, a lightly-doped N-type region in the lightly-doped P-type layer, a Schottky contact on the lightly-doped N-type region connected to a control terminal, and a connection between the lightly-doped N-type region and the P-type base well.

Claims (15)

1. A vertical thyristor adapted to an HF control, comprising a cathode region in a P-type base well, and comprising:

a lightly-doped P-type layer next to the base well,

a lightly-doped N-type region in said lightly-doped P-type layer,

a Schottky contact on the lightly-doped N-type region connected to a control terminal, and

a connection between the lightly-doped N-type region and the P-type base well, wherein the connection between the lightly-doped N-type region and the P-type base well is formed via a more heavily-doped N-type region formed in the lightly-doped N-type region.

2. The thyristor of claim 1 , wherein the lightly-doped P-type layer also extends under the periphery of the base well.

3. The thyristor of claim 1 , formed from a lightly-doped N-type substrate, wherein the doping level of the substrate is on the order of 10 14 at./cm3, the doping level of the lightly-doped P-type layer is on the order of 10 15 at./cm3, and the doping level of the lightly-doped N-type region is on the order of 10 16 at./cm3.

4. A vertical thyristor comprising:

a semiconductor substrate;

an anode region on a rear surface of the semiconductor substrate;

a cathode region in a P-type base well on a front surface of the semiconductor substrate;

a lightly-doped P-type layer next to the P-type base well;

a lightly-doped N-type region in the lightly-doped P-type layer;

a Schottky contact on the lightly-doped N-type region, the Schottky contact connected to a control terminal; and

a connection between the lightly-doped N-type region and the P-type base well, wherein the connection between the lightly-doped N-type region and the P-type base well includes a more heavily-doped N-type region in the lightly-doped N-type region.

Assignments (2)
CHANGE OF NAME Recorded Jan 21, 2024
From: STMICROELECTRONICS SA
To: STMICROELECTRONICS FRANCE
Reel/Frame 066357/0585 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 15, 2006
From: MAURIAC, CHRISTOPHE; MENDAR, SAMUEL
To: STMICROELECTRONICS, S.A.
Reel/Frame 018718/0987 →
Priority Claims (1)
FR 05 53914 · Dec 16, 2005 · national
Continuity (1)
Related Publication 20070138502A1 · Jun 21, 2007