Thin film electroluminescence display device and method of manufacturing the same

1. A method of manufacturing an electroluminescence display device, the method comprising:

preparing a transparent substrate;

forming an insulation thin-film layer on the transparent substrate;

forming a photoresist layer on the insulation thin-film layer;

patterning the photoresist layer using a laser hologram;

etching the patterned photoresist layer;

forming a corrugated structure arranged in a predetermined pitch by etching the insulation thin-film layer using the etched photoresist layer, the corrugated structure dispersing light through diffraction and reflection; and

forming layers on the corrugated structure, the formed layers following a shape of the corrugated structure,

wherein the forming the corrugated structure comprises forming a plurality of dots in the predetermined pitch, each dot having a cylindrical shape or a polygonal shape.

2. The method of claim 1 , wherein the forming of the layers comprises:

sequentially forming a first electrode layer, a first insulation layer, a fluorescent layer, a second insulation layer, and a second electrode layer on the corrugated structure.

3. The method of claim 1 , wherein the forming of the plurality of dots, when each dot is formed to have a cylindrical shape, further comprises:

forming each dot to have a circular top surface satisfying 0.05<2D/P<0.5 in which D and P represent a diameter of the top surface and the pitch, respectively.

4. The method of claim 1 , wherein the predetermined pitch between corrugating members of the corrugated structure is λ/4 to 4λ in which λ is a wavelength of light emitted from a fluorescent layer of the formed layers.

5. The method of claim 4 , wherein the predetermined pitch between the corrugating members is 100 to 2400 nm.

6. The method of claim 1 , wherein a height of corrugating members of the corrugated structure is 50 to 1000 nm.

7. A method of manufacturing an electroluminescence display device, the method comprising:

preparing a transparent substrate;

forming an insulation thin-film layer on the transparent substrate;

forming a photoresist layer on the insulation thin-film layer;

patterning the photoresist layer using a laser hologram;

etching the patterned photoresist layer;

forming a corrugated structure arranged in a predetermined pitch by etching the insulation thin-film layer using the etched photoresist layer, the corrugated structure dispersing light through diffraction and reflection; and

forming layers on the corrugated structure, the formed layers following a shape of the corrugated structure,

wherein the forming the corrugated structure comprises:

forming a plurality of holes arranged in the predetermined pitch, each hole of the plurality of holes independently having a cylindrical shape, a polygonal shape, or an elliptical shape.

8. A method of manufacturing an electroluminescence display device, the method comprising:

forming a corrugated structure having a predetermined pattern, comprising:

forming a first thin film on a transparent substrate by vacuum deposition of SiO 2 ,

forming a second thin film on the first thin film by vacuum deposition of Cr or Si,

etching the second thin film to form the predetermined pattern, and

etching the first thin film according to the etched second thin film; and

sequentially forming a first electrode layer, a first insulation layer, a fluorescent layer, a second insulation layer, and a second electrode layer on the transparent substrate to follow a shape of the corrugated structure.

9. A method of manufacturing an electroluminescence display device, the method comprising:

forming an insulation thin-film layer on an insulating layer in a pixel area;

forming a photoresist layer on the insulation thin-film layer;

patterning and etching the photoresist layer;

forming a corrugated structure arranged in a predetermined pitch by etching the insulation thin-film layer according to the etched photoresist layer; and

forming layers on the corrugated structure, the formed layers following a shape of the corrugated structure,

wherein the forming the corrugated structure comprises forming a plurality of dots and/or holes arranged in the predetermined pitch, each dot and/or hole independently having a cylindrical shape or a polygonal shape.

10. The method of claim 9 , wherein the forming of the layers comprises:

sequentially forming a first electrode, a fluorescent layer, and a second electrode on the corrugated structure, the first electrode being electrically connected to an electrode of a thin film transistor formed in a driving area.

11. The method of claim 10 , wherein the forming of the layers further comprises:

forming a first insulation layer between the first electrode and the fluorescent layer; and

forming a second insulation layer between the fluorescent layer and the second electrode.

12. A method of manufacturing an electroluminescence display device, the method comprising:

preparing a transparent substrate;

forming a photoresist layer on the substrate;

patterning and etching the photoresist layer;

forming a corrugated structure arranged in a predetermined pitch by etching the substrate according to the etched photoresist layer; and

forming layers on the corrugated structure, the formed layers following a shape of the corrugated structure,

wherein the forming the corrugated structure comprises forming a plurality of dots and/or holes arranged in the predetermined pitch, each hole and/or dot of the plurality of holes and/or dots independently having a cylindrical shape, a polygonal shape, or an elliptical shape.