IP Library Granted Patent US 7,910,892
Granted Patent B2
US 7,910,892 · App. 11/641,696 · Granted Mar 22, 2011

Method for manufacturing X-ray detector and X-ray detector

Assignees: Kabushiki Kaisha Toshiba; Toshiba Electron Tubes & Devices Co., Ltd.
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Quick Facts
Patent No.
US 7,910,892
App. No.
11/641,696
Granted
Mar 22, 2011
Kind
B2
Abstract

A first protective layer is formed on the surface of a photoelectric conversion substrate on which photoelectric transducers have been provided, and then, a scintillator layer is formed thereon, whereby degradation of the photoelectric transducers due to the contact with the scintillator layer is prevented. A second protective layer covering the surface of the scintillator is formed. A peripheral part of the first protective layer is allowed to be in close contact with a peripheral part of the second protective layer to seal the scintillator layer between the first protective layer and the second protective layer, whereby degradation of the scintillator layer due to the moisture in the atmospheric air is prevented.

Claims (18)

1. A method for manufacturing an X-ray detector, comprising:

forming, using vapor phase epitaxy, a first protective layer on a surface of a photoelectric conversion substrate on which photoelectric transducers have been provided, the first protective layer being formed of an organic material or an inorganic material;

forming a scintillator layer on a surface of the first protective layer; and

forming a second protective layer composed of the same material as that of the first protective layer so as to cover the surface of the scintillator layer, such that a peripheral part of the second protective layer is allowed to be in close contact with a peripheral part of the first protective layer to seal the scintillator layer between the first protective layer and the second protective layer,

wherein portions of the first and second protective layers which cover an electrode connection part included in the photoelectric conversion substrate are eliminated, and

wherein the first and second protective layer have insulation properties, vapor blocking properties, and transmitting light emitted from the scintillator layer properties.

2. A method for manufacturing an X-ray detector, comprising:

forming, using vapor phase epitaxy, a first protective layer on a surface of a photoelectric conversion substrate on which photoelectric transducers have been provided, the first protective layer being formed of an organic material or an inorganic material;

forming a scintillator layer on a surface of the first protective layer; and

forming a second protective layer composed of the same material as that of the first protective layer so as to cover the surface of the scintillator layer and such that a peripheral part of the second protective layer is allowed to be in close contact with a peripheral part of the first protective layer to seal the scintillator layer between the first protective layer and the second protective layer,

wherein the material constituting the first protective layer and the second protective layer is an organic material containing polyparaxylylene as a main component, and

wherein portions of the first and second protective layers which cover an electrode connection part included in the photoelectric conversion substrate are eliminated.

3. A method for manufacturing an X-ray detector, comprising:

forming, using vapor phase epitaxy, a first protective layer on a surface of a photoelectric conversion substrate on which photoelectric transducers have been provided, the first protective layer being formed of an organic material or an inorganic material;

forming a scintillator layer on a surface of the first protective layer; and

forming a second protective layer composed of the same material as that of the first protective layer so as to cover the surface of the scintillator layer and such that a peripheral part of the second protective layer is allowed to be in close contact with a peripheral part of the first protective layer to seal the scintillator layer between the first protective layer and the second protective layer;

wherein the material constituting the first protective layer and the second protective layer is an inorganic material containing a carbon crystal as a main component, and

wherein portions of the first and second protective layers which cover an electrode connection part included in the photoelectric conversion substrate are eliminated.

Assignments (3)
CHANGE OF NAME Recorded Dec 11, 2018
From: TOSHIBA ELECTRON TUBES & DEVICES CO., LTD.
To: CANON ELECTRON TUBES & DEVICES CO., LTD.
Reel/Frame 047788/0490 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 2, 2016
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA ELECTRON TUBES & DEVICES CO., LTD.
Reel/Frame 038773/0680 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2007
From: HORIUCHI, HIROSHI; AIDA, HIROSHI
To: KABUSHIKI KAISHA TOSHIBA; TOSHIBA ELECTRON TUBES & DEVICES CO., LTD.
Reel/Frame 018947/0804 →
Priority Claims (1)
JP 2005-369494 · Dec 22, 2005 · national
Continuity (1)
Related Publication 20080035849A1 · Feb 14, 2008