IP Library Patent Application 11642669
Patent Application
App. No. 11/642,669

Low viscosity precursor compositions and methods for the deposition of conductive electronic features

Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US None
App. No.
11/642,669
Abstract

A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.

Claims (77)

1 . A process for forming a flat panel display conductive feature, comprising:

(a) direct printing a precursor composition onto a substrate, wherein the precursor composition comprises metallic particles and metal oxide particles; and

(b) heating the precursor composition to form the flat panel display conductive feature on the substrate, the flat panel display conductive feature having a minimum feature size of not greater than 100 μm.

2 . The process of claim 1 , wherein the direct printing comprises syringe printing.

3 . The process of claim 1 , wherein the direct printing comprises aerosol jet deposition.

4 . The process of claim 1 , wherein the direct printing comprises ink jet printing.

5 . The process of claim 4 , wherein the direct printing comprises directing droplets of the precursor composition toward a surface of the substrate, the droplets having an average droplet size not greater than about 10 μm.

6 . The process of claim 5 , wherein the average droplet size is not greater than about 5 μm.

7 . The process of claim 4 , wherein the ink jet printing comprises depositing droplets onto the substrate at a rate of 1000 drops per second or higher.

8 . The process of claim 7 , wherein each droplet comprise from about 25 to 100 picoliters of the precursor composition.

9 . The process of claim 4 , wherein the minimum feature size is not greater than 75 μm.

10 . The process of claim 4 , wherein the minimum feature size is not greater than 50 μm.

11 . The process of claim 4 , wherein the minimum feature size is not greater than 25 μm.

12 . The process of claim 4 , wherein the process further comprises surface modifying a surface of the substrate prior to the direct printing.

13 . The process of claim 12 , wherein the surface modifying comprises laser patterning.

14 . The process of claim 12 , wherein the surface modifying comprises forming trenches in the surface by chemical etching or photochemical means.

15 . The process of claim 4 , wherein the metal oxide particles comprise metal oxide nanoparticles.

16 . The process of claim 4 , wherein the metal oxide particles comprise a metal oxide selected from the group consisting of In 2 O 3 , indium-tin oxide (ITO), antimony-tin oxide (ATO), pyrogenous silica, surface modified silica, copper oxide, and aluminum oxide.

17 . The process of claim 4 , wherein the metal oxide particles comprise glass particles.

18 . The process of claim 4 , wherein the metallic particles comprise a metal selected from the group consisting of silver, palladium, copper, gold, platinum and nickel.

19 . The process of claim 4 , wherein the metallic particles have a volume median particle size of not greater than 100 nm.

20 . The process of claim 4 , wherein the metallic particles have a volume median particle size of not greater than 0.3 μm.

21 . The process of claim 20 , wherein the metallic particles comprise a cap or coating thereon.

22 . The process of claim 21 , wherein the cap or coating comprises an inorganic cap or coating.

23 . The process of claim 21 , wherein the cap or coating comprises silica.

24 . The process of claim 21 , wherein the cap or coating comprises glass.

25 . The process of claim 21 , wherein the cap or coating comprises an organic cap or coating.

26 . The process of claim 21 , wherein the cap or coating comprises a polymer.

27 . The process of claim 21 , wherein the cap or coating comprises an intrinsically conductive polymer, a sulfonated perfluorohydrocarbon polymer, polystyrene, polystyrene/methacrylate, sodium bis(2-ethylhexyl) sulfosuccinate, tetra-n-octyl-ammonium bromide or an alkane thiolate.

28 . The process of claim 21 , wherein the cap or coating comprises PVP.

29 . The process of claim 20 , wherein at least 80 volume percent of the metallic particles are not larger than twice the average particle size.

30 . The process of claim 4 , wherein the heating comprises heating in air at from about 450° C. to 600° C.

31 . The process of claim 4 , wherein the substrate comprises glass.

32 . The process of claim 4 , wherein the substrate comprises a polymer.

33 . The process of claim 4 , wherein the flat panel display conductive feature comprises an electrode.

34 . The process of claim 4 , wherein the flat panel display conductive feature comprises a bus line.

35 . The process of claim 4 , wherein the flat panel display conductive feature comprises a transparent conductive feature.

36 . The process of claim 4 , wherein the flat panel display conductive feature comprises indium-tin oxide or antimony-tin oxide.

37 . The process of claim 4 , wherein the flat panel display conductive feature has a thickness greater than 1 μm.

38 . The process of claim 4 , wherein the flat panel display conductive feature has a thickness greater than 5 μm.

39 . The process of claim 4 , wherein the flat panel display conductive feature comprises a metal-glass composition.

40 . The process of claim 4 , wherein the process further comprises high shear mixing the precursor composition.

41 . A process for forming a flat panel display conductive feature, the process comprising heating an ink jet printed precursor composition to form the flat panel display conductive feature on a substrate, wherein the precursor composition comprises metallic particles and metal oxide particles, and wherein the flat panel display conductive feature has a width of not greater than 100 μm.

42 . The process of claim 41 , wherein the direct printing comprises directing droplets of the precursor composition toward a surface of the substrate, the droplets having an average droplet size not greater than about 10 μm.

43 . The process of claim 42 , wherein the average droplet size is not greater than about 5 μm.

44 . The process of claim 41 , wherein the ink jet printing comprises depositing droplets onto the substrate at a rate of 1000 drops per second or higher.

45 . The process of claim 44 , wherein each droplet comprise from about 25 to 100 picoliters of the precursor composition.

46 . The process of claim 41 , wherein the minimum feature size is not greater than 75 μm.

47 . The process of claim 41 , wherein the minimum feature size is not greater than 50 μm.

48 . The process of claim 41 , wherein the minimum feature size is not greater than 25 μm.

49 . The process of claim 41 , wherein the a surface of the substrate is surface modified.

50 . The process of claim 49 , wherein the surface modifying comprises forming trenches in the surface by chemical etching or photochemical means.

51 . The process of claim 41 , wherein the metal oxide particles comprise metal oxide nanoparticles.

52 . The process of claim 41 , wherein the metal oxide particles comprise a metal oxide selected from the group consisting of In 2 O 3 , indium-tin oxide (ITO), antimony-tin oxide (ATO), pyrogenous silica, surface modified silica, copper oxide, and aluminum oxide.

53 . The process of claim 41 , wherein the metal oxide particles comprise glass particles.

54 . The process of claim 41 , wherein the metallic particles comprise a metal selected from the group consisting of silver, palladium, copper, gold, platinum and nickel.

55 . The process of claim 41 , wherein the metallic particles have a volume median particle size of not greater than 100 nm.

56 . The process of claim 41 , wherein the metallic particles have a volume median particle size of not greater than 0.3 μm.

57 . The process of claim 56 , wherein the metallic particles comprise a cap or coating thereon.

58 . The process of claim 57 , wherein the cap or coating comprises an inorganic cap or coating.

59 . The process of claim 57 , wherein the cap or coating comprises silica.

60 . The process of claim 57 , wherein the cap or coating comprises glass.

61 . The process of claim 57 , wherein the cap or coating comprises an organic cap or coating.

62 . The process of claim 57 , wherein the cap or coating comprises a polymer.

63 . The process of claim 57 , wherein the cap or coating comprises an intrinsically conductive polymer, a sulfonated perfluorohydrocarbon polymer, polystyrene, polystyrene/methacrylate, sodium bis(2-ethylhexyl) sulfosuccinate, tetra-n-octyl-ammonium bromide or an alkane thiolate.

64 . The process of claim 57 , wherein the cap or coating comprises PVP.

65 . The process of claim 56 , wherein at least 80 volume percent of the metallic particles are not larger than twice the average particle size.

66 . The process of claim 41 , wherein the heating comprises heating in air at from about 450° C. to 600° C.

67 . The process of claim 41 , wherein the substrate comprises glass.

68 . The process of claim 41 , wherein the substrate comprises a polymer.

69 . The process of claim 41 , wherein the flat panel display conductive feature comprises an electrode.

70 . The process of claim 41 , wherein the flat panel display conductive feature comprises a bus line.

71 . The process of claim 41 , wherein the flat panel display conductive feature comprises a transparent conductive feature.

72 . The process of claim 41 , wherein the flat panel display conductive feature comprises indium-tin oxide or antimony-tin oxide.

73 . The process of claim 41 , wherein the flat panel display conductive feature has a thickness greater than 1 μm.

74 . The process of claim 41 , wherein the flat panel display conductive feature has a thickness greater than 5 μm.

75 . The process of claim 41 , wherein the flat panel display conductive feature comprises a metal-glass composition.