Printing method for high performance electronic devices
View Patent ↗A method of depositing elongated nanostructures that allows accurate positioning and orientation is described. The method involves printing or otherwise depositing elongated nanostructures in a carrier solution. The deposited droplets are also elongated, usually by patterning the surface upon which the droplets are deposited. As the droplet evaporates, the fluid flow within the droplets is controlled such that the nanostructures are deposited either at the edge of the elongated droplet or the center of the elongated droplet. The described deposition technique has particular application in forming the active region of a transistor.
1. A structure for forming a transistor comprising:
a dielectric substrate, the dielectric substrate having a first surface that includes a fluid accumulation region between an area for a source electrode and an area for a drain electrode, the fluid accumulation region being pre-patterned via changing surface energies or topologies; and,
a droplet of fluid in the fluid accumulation region, the droplet including semiconductor nanowires suspended in a carrier fluid, the droplet elongated due to the pre-patterned fluid accumulation region such that upon evaporation of the carrier fluid, the nanowires are aligned to form the active region of the transistor between a source electrode and a drain electrode as the droplet reduces in size.
2. The structure of claim 1 further comprising: a metal source electrode in the area for a source electrode and a metal drain electrode in the area for a drain electrode.
3. The structure of claim 1 further comprising:
a gate electrode, the gate electrode formed on a second surface, the second surface on an opposite side of the dielectric substrate then the first surface.
4. The structure of claim 1 wherein the fluid volume of the droplet is less than 1000 picoliters.
5. The structure of claim 1 wherein the distance from the area for the source electrode and the area for the drain electrode is less than the length of a nanowire in the droplet.
6. The structure of claim 1 wherein a border of the fluid accumulation region is defined by a border, the border of the fluid accumulation region being more hydrophobic than the surface within the fluid accumulation region.
7. The structure of claim 1 wherein the nanowires are aligned in a center area of the droplet.
8. The structure of claim 1 wherein a contact line of the droplet moves inward, pushing the nanowires toward droplet center as the droplet evaporates.
9. The structure of claim 1 wherein the fluid wherein the fluid includes a solvent that exhibits a small contact angle hysteresis.
10. The structure of claim 1 wherein the fluid has two solvents with different vapor pressures and surface tensions.
11. The structure of claim 1 wherein the nanowires are aligned at perimeter of the droplet.
12. The structure of claim 1 wherein a contact line of the droplet stays approximately fixed, keeping the nanowires near perimeter of the droplet as the droplet evaporates.
13. The structure of claim 1 wherein the fluid includes a solvent that exhibits a large contact angle hysteresis.
14. The structure of claim 1 wherein the fluid includes a solvent that exhibits a contact angle hysteresis exceeding 10 degrees.