Liquid crystal display device and method of fabricating the same
An LCD device and a method of fabricating the device, in which the method includes preparing an insulating substrate including a gate wiring area and sequentially forming a gate wiring layer including a silver layer and a self-assembled monolayer on the insulating substrate. A mold mask is positioned above the insulating substrate, where the mold mask has a predetermined pattern to expose the gate wiring area. A self-assembled monolayer pattern is formed by printing the predetermined pattern of the mold mask into the self-assembled monolayer and a gate wiring pattern is formed by selectively etching the silver layer using the self-assembled monolayer pattern as an etching mask, where the gate wiring pattern includes a gate pad, a gate electrode and a gate line. The LCD device includes a gate wiring layer including a self-assembled monolayer and a metal layer of silver overlying an insulating substrate.
1. An LCD device comprising:
an insulating substrate; and
a gate wiring layer overlying the insulating substrate, wherein the gate wiring includes a gate electrode, a gate pad and a gate line, and
wherein the gate wiring layer comprises a dual-layered structure including metal layer having silver and a self-assembled monolayer overlying the metal layer.
2. The LCD device of claim 1 further comprising a buffer layer between the insulating substrate and the gate wiring layer.
3. The LCD device of claim 2 , wherein the buffer layer comprises a Si layer and/or SiOx layer.
4. The LCD device of claim 2 further comprising a glue layer between the buffer layer and the gate wiring layer.
5. The LCD device of claim 4 , wherein the glue layer comprises Ti.
6. An LCD device comprising:
an insulating substrate;
a gate electrode overlying the insulating substrate, wherein the gate electrode comprises a dual-layered structure including a metal layer comprising silver and a self-assembled monolayer overlying the metal layer;
a gate insulating layer overlying the insulating substrate and the gate electrode;
an active layer overlying the gate insulating layer;
source and drain electrodes on the active layer, wherein the source electrode is separated from the drain electrode by a fixed distance; and
a pixel electrode coupled to the drain electrode.
7. The LCD device of claim 6 further comprising a buffer layer between the insulating substrate and the gate electrode.
8. The LCD device of claim 7 further comprising a glue layer between the buffer layer and the gate electrode.
9. The LCD device of claim 8 , wherein the glue layer comprises Ti.