Color filter substrate for liquid crystal display, and manufacturing method thereof
View Patent ↗A color filter substrate for a liquid crystal display device includes a transparent insulation substrate, a black matrix defining first and second pixel areas on the transparent insulation substrate, and a color filter in the first and second pixel areas for displaying first and second colors, respectively, wherein a surface of the black matrix having recesses at sides thereof adjacent to the first and second pixel areas, respectively, for preventing an overflow of the first color from the first pixel area into the second pixel area.
1. A color filter substrate for a liquid crystal display device, comprising:
a transparent insulation substrate;
a black matrix having a bank defining first and second pixel areas on the transparent insulation substrate, the bank having first and second recesses; and
first and second color filters in the first and second pixel areas for displaying first and second colors, respectively,
wherein the first color filter comprises a first color material, and the second color filter comprises a second color material,
wherein the first recess is formed on an upper surface of the bank surrounding the first pixel area to contain the first color material overflown from the first pixel area, the second recess is formed on the upper surface of the bank surrounding the second pixel area to contain the second color material overflown from the second pixel area, and the first and second recesses are apart from each other to prevent the first color material and the second color material from mixing with each other, and
wherein both of the first and second recesses are positioned between the first and second pixel areas which are directly adjacent to each other, and a depth of each recess is smaller than a thickness of the black matrix.
2. The color filter substrate as claimed in claim 1 , wherein each of the color filters includes one of a photo resist with a pigment and a color ink.
3. The color filter substrate as claimed in claim 1 , wherein each of the recesses is shaped as a well.
4. The color filter substrate as claimed in claim 1 , wherein the black matrix includes a resin.
5. The color filter substrate as claimed in claim 1 , wherein the black matrix includes a thin film of metal.
6. The color filter substrate as claimed in claim 1 , further comprising:
an overcoat layer on the color filters and the black matrix to planarize the surface of the color filters.
7. A method for manufacturing a color filter for a liquid crystal display device including a transparent insulating substrate, comprising:
forming a black matrix having a bank defining first and second pixel areas on the transparent insulation substrate;
forming a first recess on an upper surface of the bank surrounding the first pixel area to contain a first color from the first pixel area;
forming a second recess on the surface of the bank surrounding the second pixel area to contain a second color from the second pixel area;
providing the first color material of a first color filter into the first pixel area and into the first recess; and
providing the second color material of a second color filter into the second pixel area and into the second recess,
wherein both of the first and second recesses positioned between the first and second pixel areas which are directly adjacent to each other and a depth of each recess is smaller than a thickness of the black matrix, and the first and second recesses are apart from each other on the upper surface of the bank to prevent the first color material and the second color material from mixing with each other.
8. The method of claim 7 , wherein the recesses are shaped as wells.
9. The method of claim 7 , wherein the black matrix is formed of a resin.
10. The method of claim 9 , wherein forming the recesses including exposing the resin to light through a plurality of slits.
11. The method of claim 7 , wherein the black matrix includes a thin film of metal.
12. The method of claim 11 , wherein the recesses are formed by etching the metal thin film.
13. The method of claim 7 , wherein forming the first and second color filters including using a color photo resist containing a pigment.
14. The method of claim 7 , wherein forming the first and second color filters including dripping a color ink.
15. The method of claim 7 , wherein forming the first and second color filters is concurrently performed.
16. The method of claim 7 , further comprising forming an overcoat layer on the first and second color filters and the black matrix to planarize a surface of the first and second color filters.
17. The method of claim 16 , wherein forming the overcoat layer including depositing an organic material on the surface of the first and second color filters.
18. The method of claim 7 , wherein the forming the recesses including scarcely exposing the black matrix by transmitting light through slits in a mask.
19. The method of claim 7 , wherein the forming the recesses including controlling an amount of light incident onto the surface of the black matrix by a width of slits in a mask.
20. The method of claim 7 , wherein the forming the recesses including solidifying portions of the black matrix by exposing to a light and removing portions thereof that are unexposed to the light.