Resistance random access memory device and a method of manufacturing the same
Provided is a resistance random access memory (RRAM) device and a method of manufacturing the same. A resistance random access memory (RRAM) device may include a lower electrode, a first oxide layer on the lower electrode and storing information using two resistance states, a current control layer made of a second oxide on the first oxide layer and an upper electrode on the current control layer.
1. A RRAM (resistance random access memory device) device comprising:
a lower electrode;
a first oxide layer on the lower electrode and storing information using two resistance states, wherein the first oxide layer is made of one selected from the group consisting of NiO x , ZrO x , Nb 2 O 5-x , HfO, ZnO, WO 3 , CoO, CuO 2 , and TiO 2 ;
a current control layer made of a second oxide on the first oxide layer; and
an upper electrode on the current control layer,
wherein the current control layer has a resistance within a range between about 10 ohm and about 10 kohm, and
wherein the first oxide layer directly contacts the lower electrode, and the current control layer directly contacts the upper electrode.
2. The RRAM device of claim 1 , wherein the current control layer is made of one of ZnOx and RuOx which are doped with transition metals.
3. The RRAM device of claim 1 , wherein the current control layer is made of a transition metal oxide.
4. The RRAM device of claim 1 , wherein the current control layer is made of one of ZnO and RuOx which are doped with one of Al and In.
5. The RRAM device of claim 1 , wherein the current control layer is made of one of SiO 2 and Zr-rich ZrO 2 which are doped with metals.
6. A method of manufacturing a RRAM (resistance random access memory device) device comprising:
providing a lower electrode;
forming a first oxide layer on the lower electrode and storing information using two resistance states, wherein the first oxide layer is made of one selected from the group consisting of NiO x , ZrO x , Nb 2 O 5-x , HfO, ZnO, WO 3 , CoO, CuO 2 , and TiO 2 ;
forming a current control layer made of a second oxide on the first oxide layer; and
forming an upper electrode on the current control layer,
wherein the current control layer has a resistance within a range between about 10 ohm and about 10 kohm, and
wherein the first oxide layer directly contacts the lower electode, and the current control layer directly contacts the upper electrode.
7. The method of claim 6 , wherein the current control layer is made of one of ZnOx and RuOx which are doped with transition metals.
8. The method of claim 6 , wherein the current control layer is made of a transition metal oxide.
9. The method of claim 6 , wherein the current control layer is made of one of ZnO and RuOx which are doped with one of Al and In.
10. The method of claim 6 , wherein the current control layer is made of one of SiO 2 and Zr-rich ZrO 2 which are doped with metals.