Multilayer wiring board for an electronic device
View Patent ↗A multilayer wiring board includes a first insulating film and a first patterned metal wiring film extending along a first major surface thereof, and a second insulating film a second patterned metal wiring film extending along a second major surface thereof. The wiring board includes solid metal interconnects connecting the first patterned metal wiring film to the second patterned metal wiring film, the interconnects extending through at least one of the first and second insulating films, and a microelectronic element disposed between the first and second patterned wiring films, the microelectronic element having bond pads conductively connected to the first patterned metal wiring films. The wiring board also includes a plurality of external contacts exposed at one or more external surfaces of the multilayer wiring board, the contacts being conductively connected to at least one of the first and second patterned metal wiring films.
1. A multilayer wiring board comprising:
a first insulating film having a first major surface and a first patterned metal wiring film extending along said first major surface;
a second insulating film having a second major surface and a second patterned metal wiring film extending along said second major surface, said second insulating film overlying said first insulating film and at least said second patterned metal wiring film contacting said first insulating film;
a plurality of solid metal interconnects conductively connecting said first patterned metal wiring film to said second patterned metal wiring film, said solid metal interconnects extending through at least one of said first and second insulating films in a direction transverse to said first and second major surfaces;
a microelectronic element disposed between said first and second patterned wiring films, said microelectronic element having bond pads conductively connected to said first patterned metal wiring films;
a plurality of solid metal bump interconnects conductively connecting said bond pads of said microelectronic element with said first patterned metal wiring film, wherein said solid metal bump interconnects consist essentially of at least one metal selected from the group consisting of copper and nickel; and
a plurality of external contacts exposed at one or more external surfaces of said multilayer wiring board, said contacts being at least one of (a) conductively connected to at least one of said first and second patterned metal wiring films; or (b) defined by at least one of said first and second patterned metal wiring films.
2. The multilayer wiring board as claimed in claim 1 , wherein said bond pads of said microelectronic element are provided on a front surface of said microelectronic element and said bond pads are surface-mounted to contacts exposed at a front surface said at least one of said first and second patterned metal wiring films.
3. The multilayer wiring board as claimed in claim 1 , wherein said external contacts project outward from a rear surface of said at least one of said first and second patterned metal wiring films.
4. The multilayer wiring board as claimed in claim 3 , wherein said external contacts consist essentially of copper.
5. The multilayer wiring board as claimed in claim 3 , wherein said external contacts consist essentially of copper and said first and second patterned metal wiring films consist essentially of copper.
6. The multilayer wiring board as claimed in claim 1 , wherein at least one of said first and second insulating films includes at least one material selected from the group consisting of polyimide, liquid crystal polymer, glass cloth combined with a B-stage resin and a BCB film.
7. The multilayer wiring board as claimed in claim 1 , further comprising a plurality of conductive contacts projecting from a major surface of said at least one of said first and second patterned metal wiring films, wherein said bond pads of said microelectronic element are conductively connected to said contacts.
8. The multilayer wiring board as claimed in claim 1 , wherein said second major surface of said second insulating film contacts said first insulating film.
9. The multilayer wiring board as claimed in claim 1 , wherein said first insulating film includes a plurality of recesses, and said first patterned metal wiring film is embedded in said plurality of recesses in said first insulating film.
10. The multilayer wiring board as claimed in claim 1 , wherein said second insulating film includes a plurality of recesses, and said second patterned metal wiring film is embedded in said plurality of recesses in said second insulating film.
11. The multilayer wiring board as claimed in claim 1 , wherein said microelectronic element is a component selected from the group consisting of active components and passive components.
12. The multilayer wiring board as claimed in claim 1 , wherein said microelectronic element is a component selected from the group consisting of semiconductor chips, inductors, resistors and capacitors.
13. The multilayer wiring board as claimed in claim 1 , further comprising at least one other microelectronic element having a thickness of about 50 micrometers or smaller and being disposed between said first and second patterned wiring films.
14. The multilayer wiring board as claimed in claim 1 , wherein said solid metal interconnects comprise etched metal interconnects.
15. The multilayer wiring board as claimed in claim 1 , wherein said solid metal interconnects have a first height and said solid metal bump interconnects have a second height.
16. The multilayer wiring board as claimed in claim 15 , wherein said second height is less than said first height.
17. The multilayer wiring board as claimed in claim 1 , wherein said solid metal bump interconnects directly join said bond pads to said first patterned metal wiring film.
18. A multilayer wiring board comprising:
a first insulating film having a first major surface and a first patterned metal wiring film extending along said first major surface;
a second insulating film having a second major surface and a second patterned metal wiring film extending along said second major surface, said second insulating film overlying said first insulating film and at least said second patterned metal wiring film contacting said first insulating film;
a plurality of solid metal interconnects conductively connecting said first patterned metal wiring film to said second patterned metal wiring film, said solid metal interconnects extending through at least one of said first and second insulating films in a direction transverse to said first and second major surfaces;
a microelectronic element having a thickness of about 50 micrometers (μm) or smaller, said microelectronic element being disposed between said first and second patterned wiring films, said microelectronic element having bond pads conductively connected to said first patterned metal wiring films;
a plurality of plated solid metal bump interconnects conductively connecting said bond pads of said microelectronic element with said first patterned wiring film; and
a plurality of external contacts exposed at one or more external surfaces of said multilayer wiring board, said contacts being conductively connected to at least one of said first and second patterned metal wiring films.
19. The multilayer wiring board as claimed in claim 18 , wherein said solid metal bump interconnects are plated on said first patterned metal wiring film.
20. The multilayer wiring board as claimed in claim 18 , wherein said solid metal bump interconnects are plated on said bond pads.
21. The multilayer wiring board as claimed in claim 18 , wherein said solid metal bump interconnects directly join said bond pads to said first patterned metal wiring film.