Manufacturing method for vibrator
View Patent ↗After an external shape of a photoresist layer is patterned with use of a Cr film as an underlayer, i.e., a metal film to serve as an anticorrosive film that resists crystal etching, and an Au film as a surface layer, the Au film is etched. After groove portions are then patterned, the Cr film is etched. Since no degenerated-surface layer cannot be formed on the photoresist layer with an etchant for the Au film, the groove portions can be patterned without any degenerated-surface layer according to this method, so that high-accuracy groove portions can be formed.
1. A manufacturing method for a vibrator having a groove portion on at least one surface thereof, comprising:
a step of forming a metal film composed of an underlayer and a surface layer on a surface of a substrate made of a piezoelectric material;
a step of spreading a photoresist on the surface layer of the metal film, thereby forming a photoresist layer thereon;
a step of patterning the photoresist layer into an external shape of the vibrator, thereby removing first unnecessary parts of the photoresist layer;
a step of etching away those parts of the surface layer which are exposed corresponding to the removed first unnecessary parts of the photoresist layer, thereby exposing the underlayer;
then, after exposing the underlayer, a step of patterning the photoresist layer to remove second unnecessary parts of the photoresist layer without exfoliating the photoresist layer remaining on the surface layer, thereby exposing the surface layer corresponding to the groove portion;
then, after exposing the surface layer corresponding to the groove portion, a step of etching away those parts of the underlayer which have so far been exposed in the preceding steps which correspond to the removed first unnecessary parts of the photoresist layer, thereby exposing the surface of the substrate;
a step of etching away exposed parts of the substrate, thereby forming the external shape of the vibrator;
a step of etching away those parts of the surface layer and the underlayer which correspond to the removed second unnecessary parts of the photoresist layer in the groove portion, thereby exposing the surface of the substrate;
a step of etching the surface of the substrate exposed corresponding to the groove portion, thereby forming the groove portion; and
a step of removing the remaining surface layer and the underlayer of the metal film.
2. The manufacturing method for a vibrator according to claim 1 , wherein the vibrator is formed of a rock crystal.
3. The manufacturing method for a vibrator according to claim 1 or 2 , wherein Cr is used for the metal film of the underlayer, and Au is used for the metal film of the surface layer.
4. The manufacturing method for a vibrator according to claim 3 , wherein a solution containing iodine and potassium iodide is used as an etchant for etching the surface layer of the metal film.
5. The manufacturing method for a vibrator according to claim 1 , wherein the vibrator is a tuning fork-type vibrator having the groove portion on each vibrating tine portion.
6. The manufacturing method for a vibrator according to claim 1 , wherein the vibrator is an inverted-mesa vibrator using the groove portion as a vibrating body.
7. A manufacturing method for a vibrator, comprising:
a step of forming a Cr film on a surface of a crystal substrate, forming an Au film on a surface of the Cr film, and spreading a photoresist on the Au film, thereby forming a photoresist layer thereon;
a step of patterning the photoresist layer into an external shape of the tuning fork-type vibrator, thereby removing first unnecessary parts of the photoresist layer;
a step of etching away those parts of the Au film which are exposed corresponding to the first unnecessary removed parts of the photoresist layer, thereby exposing the Cr film;
then, after exposing the Cr film, a step of patterning the photoresist layer into an external shape of a groove portion of each vibrating tine portion of the tuning fork-type vibrator to remove second unnecessary parts of the photoresist layer without exfoliating the photoresist layer remaining on the Au film, thereby exposing the Au film corresponding to the groove portion;
then, after exposing the Au film corresponding to the groove portion, a step of etching away those parts of the Cr film which have so far been exposed in the preceding steps which correspond to the removed first unnecessary parts of the photoresist lager, thereby exposing the surface of the substrate;
a step of etching away exposed parts of the substrate, thereby forming the external shape of the vibrator;
a step of etching away those parts of the Au film and the Cr film which correspond to the removed second unnecessary parts of the photoresist layer in the groove portion, thereby exposing the surface of the substrate;
a step of etching the surface of the substrate exposed corresponding to the groove portion, thereby forming the groove portion; and
a step of removing the remaining Au film and Cr film.