Method and apparatus for forming protective layer
View Patent ↗An apparatus for forming a protective layer of magnesium oxide on a front glass substrate ( 11 ) in an evaporation chamber ( 201 ) includes the following: oxygen outlet openings ( 222 ) for introducing oxygen into the evaporation chamber ( 201 ); water vapor outlet openings ( 210 ) for introducing water vapor into the evaporation chamber ( 201 ) from the downstream side in the transfer direction of the front glass substrate ( 11 ); a mass analyzer ( 224 ) for measuring the ionic strength of hydrogen and the ionic strength of oxygen in the evaporation chamber ( 201 ); and mass flow controllers ( 215 ) and ( 221 ) for controlling the introduction amount of the water vapor and the introduction amount of the oxygen, respectively, by the ionic strengths measured by the mass analyzer ( 224 ).
1. A method for forming a protective layer while a substrate is being transferred in a film-forming chamber, the method comprising:
introducing oxygen and water vapor into the film-forming chamber, the water vapor being introduced from a downstream side in a transfer direction of the substrate;
measuring an ionic strength of hydrogen and an ionic strength of oxygen in the film-forming chamber; and
controlling an introduction amount of the water vapor and an introduction amount of the oxygen by a ratio of the ionic strength of the hydrogen to the ionic strength of the oxygen,
wherein the water vapor is introduced into the film-forming chamber within 50 mm from the surface of the substrate, the surface being to be provided with the protective layer.
2. The method for forming a protective layer of claim 1 , wherein the water vapor is introduced into the film-forming chamber along a surface of the substrate, the surface being to be provided with the protective layer.
3. The method for forming a protective layer of claim 1 , wherein the film-forming chamber includes a film-forming source; and
the ionic strength of the hydrogen and the ionic strength of the oxygen are measured in a vicinity of the film-forming source.
4. The method for forming a protective layer of claim 1 , wherein the introduction amount of the oxygen and the introduction amount of the water vapor are controlled so that the ratio of the ionic strength of the hydrogen to the ionic strength of the oxygen is not less than 50%.
5. The method for forming a protective layer of claim 1 , wherein said protective layer is made of magnesium oxide, said method further comprising:
introducing MgO vapor into the film-forming chamber.