IP Library Granted Patent US 7,593,091
Granted Patent B2
US 7,593,091 · App. 11/666,073 · Granted Sep 22, 2009

Imaging or exposure device, in particular for making an electronic microcircuit

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Quick Facts
Patent No.
US 7,593,091
App. No.
11/666,073
Granted
Sep 22, 2009
Kind
B2
Abstract

The imaging or exposure device comprises a radiation source ( 1 ), a reticle ( 3 ) mounted between the radiation source and an optical projection system ( 4 ) for shaping the radiation downstream from the reticle ( 3 ), the optical projection system ( 4 ) comprising a series of mirrors ( 7, 8, 10, 11 ) including at least two mirrors ( 10, 11 ) that are deformable, having deformer members ( 12, 13 ) connected to a control unit ( 14 ) associated with an image analyzer ( 15 ) to deform the two deformable mirrors in separate manner, firstly as a function of differences relative to an image quality setpoint, and second as a function of differences relative to an image distortion setpoint.

Claims (4)

1. An imaging or exposure device comprising a radiation source ( 1 ) emitting radiation ( 2 ), a reticle ( 3 ) mounted between the radiation source and an optical projection system ( 4 ) for shaping the radiation downstream from the reticle ( 3 ), the optical projection system ( 4 ) comprising a series of mirrors ( 7 , 8 , 10 , 11 ) for making an image ( 5 ) of the reticle ( 3 ), a plurality of mirrors ( 10 , 11 ) of the optical projection system ( 4 ) being deformable mirrors including deformer members ( 12 , 13 ) connected to a control unit ( 14 ), the device being characterized in that the number of deformable mirrors is strictly limited to two, the control unit being associated with an image analyzer ( 15 ) to deform one of the deformable mirrors ( 10 ) mainly as a function of differences relative to an image quality setpoint, and to deform the other deformable mirror mainly as a function of differences relative to an image distortion setpoint.

2. A device according to claim 1 , characterized in that one of the deformable mirrors ( 10 ) is located at the pupil of the optical projection system ( 4 ), and the corresponding deformer members ( 12 ) are controlled mainly as a function of the image quality setpoint, the other deformable mirror ( 10 ) being an intermediate mirror between the pupil of the optical projection system and the image ( 5 ) and being controlled mainly as a function of the image distortion setpoint.

3. A device according to claim 2 , characterized in that the intermediate deformable mirror ( 11 ) is disposed immediately upstream of the image ( 5 ).

4. A device according to claim 1 , characterized in that the deformer members ( 12 , 13 ) are controlled at a rate of less than 1 Hz.

Assignments (2)
TRANSFER OF PATENTS RESULTING FROM A PARTIAL CONTRIBUTION OF ASSETS Recorded May 7, 2018
From: SAGEM DÉFENSE SÉCURITÉ
To: REOSC
Reel/Frame 047091/0383 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 23, 2007
From: GEYL, ROLAND
To: SAGEM DEFENSE SECURITE
Reel/Frame 019234/0432 →