IP Library Patent Application 11666636
Patent Application
App. No. 11/666,636

Method and Apparatus for Producing Electric Discharges

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Quick Facts
Patent No.
US None
App. No.
11/666,636
Abstract

In producing discharges in a load element such as a magnetron sputtering device, electric pulses are provided from different electric pulse sources, e.g. three or more electric pulse sources. The pulse sources are controlled by a control and monitoring unit to give the element electric pulses different heights and start and end times. The element electric pulses are summed, such as by connecting the pulse sources in parallel to the load, to form resulting, relatively long electric pulses. Each of the resulting electric pulses can have a portion that has a substantially constant level and then the substantially constant level is formed from at least two element electric pulses having the same pulse height. The resulting electric pulses are applied to electrodes in the load. The element electric pulses can have the same polarity such as being half a period of a sinusoid oscillation of a single frequency. Then the time intervals between starts of successive element electric pulses are relatively short such as not being not larger than one third of the period of the sinusoid. For example, the resulting electric pulses can have a substantially rectangular shape, a shape including two different substantially constant levels or have a substantially triangular shape.

Claims (31)

1 . A method of producing electric discharges between electrodes, in particular in laser tubes, flashlamps and magnetron sputtering devices, such as for producing discharges in a gas and/or in a vapor of a solid material, characterized by the steps of:

providing element electric pulses from a plurality of electric pulse sources, in particular three or more electric pulse sources,

summing the element electric pulses to form resulting electric pulses, each of the resulting electric pulses having at least partly a substantially constant level, the substantially constant level being formed from at least two element electric pulses having the same pulse height or pulse amplitude, and

applying the resulting electric pulses to the electrodes to produce electric discharges.

2 . A method according to claim 1 , characterized in that in providing the element electric pulses, the shapes, in particular the peak levels or amplitudes, of the element electric pulses are controlled to produce, when summed, resulting electric pulses having a desired shape.

3 . A method according to claim 1 , characterized in that in providing the element electric pulses, the starts of the element electric pulses are controlled to produce, when summed, to produce resulting electric pulses having desired start times and a desired shape.

4 . A method according to claim 1 , characterized in that in providing the element electric pulses, the ends of the element electric pulses are controlled to produce, when summed, to produce resulting electric pulses having a desired shape.

5 . A method according to claim 1 , characterized in that in providing the element electric pulses, the element electric pulses are provided as pulses having the same polarity.

6 . A method according to claim 1 , characterized in that in providing the element electric pulses, the element electric pulses are provided as pulses having shapes of half of sinusoidal waves, in particular sinusoidal waves having the same frequency or the same period.

7 . A method according to claim 6 , characterized in that in providing the element electric pulses, the time interval between starts of sequential element electric pulses is smaller than ½ of a sinusoid period, in particular smaller than 0.4 of a sinusoid period and preferably not larger than one third of a sinusoid period.

8 . A method according to claim 6 , characterized in that in providing the element electric pulses, the time interval between starts of sequential element electric pulses is in the range of ⅙-½ or 0.28-0.4 of a sinusoid period, in particular substantially equal to one third of a sinusoid period.

9 . A method according to claim 1 , characterized in that in providing the element electric pulses, the element electric pulses are provided by discharging elements capable of storing electric energy, in particular capacitors or inductors.

10 . A method according to claim 1 , characterized in that in providing the element electric pulses, the element electric pulses are provided by discharging capacitors through inductors.

11 . A method according to claim 10 , characterized in that before discharging the capacitors, the capacitors are charged to controlled, adapted voltages.

12 . A method of magnetron sputtering comprising the steps of:

providing sputtering and possibly reactive gases and a work piece in a processing chamber,

producing driving electric pulses, each having at least partly a substantially constant level,

applying the driving electric pulses to create discharges in the processing chamber between an anode and a magnetron sputtering cathode,

characterized in that in producing the driving electric pulses, the driving electric pulses are obtained by summing element electric pulses generated by a plurality of electric pulse sources, the substantially constant level being formed from at least two element electric pulses having the same pulse height or pulse amplitude.

13 . A method according to claim 12 , characterized in that in providing the element electric pulses, the element electric pulses are provided as current pulses having an amplitude or pulse height not larger than 10 kA.

14 . A method according to claim 12 , characterized in that in providing the element electric pulses, numbers of sequential or consecutive element electric pulses are provided to have amplitudes or pulse heights varying in the time as a single step square function or a rectangular function, or as a two step square function.

15 . A method according to claim 12 , characterized in that in providing the element electric pulses, numbers of sequential or consecutive element electric pulses are provided to have amplitudes or pulse heights varying in the time as a two step square function, so that consecutive ones of said two step square functions follow directly after each other with no gap, for at least a repeated number of said two step square functions.

16 . A method according to claim 15 , characterized in that the total time t of said repeated number of said two step square functions is in the range of 10 microseconds to 1 second.

17 . A method according to claim 15 , characterized in that the gap time T between said repeated numbers of said two step square functions is in the range of 100 microseconds to 10 seconds.

18 . A method according to claim 15 , characterized in that the ratio t/T is smaller than 0.5 where t is the total time each of said repeated number of said two step square functions and T is the gap time between said repeated numbers of said two step square functions.

19 . A pulsed power supply assembly for connection to a discharge unit to produce electric discharges between electrodes, in particular to laser tubes, flashlamps and magnetron sputtering devices, such as for producing discharges in a gas and/or a vapor of a solid material, characterized by a plurality of element electric pulsed power supplies, in particular three or more electric pulsed power supplies, each providing element electric pulses, the element electric pulsed power supplies connected to each other to form resulting electric pulses by summing the element electric pulses, so that each of the resulting electric pulses have at least partly a substantially constant level, the substantially constant level being formed from at least two element electric pulses having the same pulse height or pulse amplitude and obtained from different pulsers.

20 . A pulsed power supply assembly according to claim 19 , characterized by a control and monitoring unit connected to each of the element electric pulsed power supplies to control the start, end and/or amplitude or pulse height of the element electric pulses.

21 . A pulsed power supply assembly according to claim 19 , characterized in that each of the element pulsed power supplies includes a harmonic oscillator.

22 . A pulsed power supply assembly according to claim 19 , characterized in that each of the element pulsed power supplies includes a dischargeable storage for electric energy, in particular a capacitor or an inductor.

23 . A pulsed power supply assembly according to claim 19 , characterized in that each of the element pulsed power supplies includes a capacitor arranged to be discharged through an inductor.

24 . A magnetron sputtering device including a pulsed power supply assembly according to claim 19 .

Assignments (6)
CHANGE OF NAME Recorded Oct 7, 2010
From: CHEMFILT R & D AKTIEBOLAG
To: CHEMFILT IONSPUTTERING AKTIEBOLAG
Reel/Frame 025105/0194 →
APPOINTMENT OF TRUSTEE IN BANKRUPTCY FOR CONVEYING PARTY, CEMECON AG, IN GERMAN WITH ENGLISH TRANSLATION Recorded Oct 7, 2010
From: CEMECON AG
To: GEORG, THOMAS
Reel/Frame 025105/0290 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 7, 2010
From: CHEMFILT IONSPUTTERING AKTIEBOLAG, BY RUNE BRANNSTOM, TRUSTEE IN BANKRUPTCY
To: CEMECON AG
Reel/Frame 025105/0384 →
CONFIRMATORY ASSIGNMENT Recorded Oct 7, 2010
From: CHEMFILT IONSPUTTERING AKTIEBOLAG, BY RUNE BRANNSTOM, TRUSTEE IN BANKRUPTCY
To: CEMECON AG, BY THOMAS GEORG, TRUSTEE IN BANKRUPTCY
Reel/Frame 025105/0411 →
APPOINTMENT OF TRUSTEE IN BANKRUPTCY FOR CONVEYING PARTY, CHEMFILT IONSPUTTERING AKTIEBOLAG, IN SWEDISH WITH ENGLISH TRANSLATION Recorded Oct 7, 2010
From: CHEMFILT IONSPUTTERING AKTIEBOLAG
To: BRANNSTOM, RUNE
Reel/Frame 025126/0300 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 11, 2008
From: KOUZNETSOV, VLADIMIR
To: CHEMFILT IONSPUTTERING AB
Reel/Frame 020790/0302 →