Liquid applicator and method for reducing the concentration of by-products from antiseptic

1. An applicator for applying an antiseptic solution to a desired surface and for selectively removing undesired by-products from the antiseptic solution, the applicator comprising:

antiseptic solution in amount sufficient to be applied to a desired surface and to have an antimicrobial effect on the desired surface, the antiseptic solution comprising aqueous chlorhexidine gluconate; and

at least one porous element, wherein the at least one porous element selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the at least one porous element.

2. The applicator of claim 1 , wherein the undesired by-product is para-chloraniline.

3. The applicator of claim 2 , wherein the at least one porous element is a hydrophilic polyester-polyurethane foam material.

4. The applicator of claim 3 , wherein the hydrophilic polyester-polyurethane foam material has pore sizes from 70 to 130 per linear inch.

5. The applicator of claim 4 , wherein the para-chloraniline in the antiseptic solution is reduced by 50-90%.

6. The applicator of claim 1 , wherein the at least one porous element is a wetted applicator sponge.

7. The applicator of claim 1 , wherein the antiseptic solution is contained in at least one ampoule and the antiseptic solution is released from the at least one ampoule and flows through the at least one porous element.

8. The applicator of claim 1 , wherein the aqueous chlorhexidine gluconate is a solution in which water is the solvent in the largest concentration by volume.

9. An applicator for applying an antiseptic solution to a desired surface and for selectively removing undesired chemicals from the antiseptic solution, the applicator comprising:

antiseptic solution in amount sufficient to be applied to a desired surface and to have an antimicrobial effect on the desired surface, the antiseptic solution being selected from the group consisting of aqueous chlorhexidine, alexidine, octenidine, alexidine, olanexidine and salts thereof;

at least one porous element, wherein the at least one porous element selectively removes undesired chemicals from the antiseptic solution when the antiseptic solution contacts the at least one porous element.

10. The applicator of claim 9 , wherein the antiseptic solution comprises alexidine dihydrochloride.

11. The applicator of claim 9 , wherein the antiseptic solution comprises octenidine dihydrochloride.

12. The applicator of claim 9 , wherein the antiseptic solution comprises olanexidine hydrochloride.

13. The applicator of claim 9 , wherein the at least one porous element is a wetted applicator sponge.

14. The applicator of claim 9 , wherein the antiseptic solution is contained in at least one ampoule.

15. The liquid applicator of claim 14 wherein the antiseptic solution is released from the at least one ampoule and flows through the at least one porous element.

16. A method for selectively removing unwanted by-products from a antiseptic solution, the method comprising;

providing an antiseptic solution in amount sufficient to be applied to a desired surface and to have an antimicrobial effect on the desired surface, the antiseptic comprising aqueous chlorhexidine gluconate; and

contacting the antiseptic solution with at least one porous element, wherein the at least one porous element selectively removes para-chloraniline from the antiseptic solution.

17. The method of claim 16 , wherein the at least one porous element is a hydrophilic polyester-polyurethane foam material.

18. The method of claim 17 , wherein the hydrophilic polyester-polyurethane foam material has pore sizes from 70 to 130 per linear inch.

19. The method of claim 18 , wherein the para-chloraniline in the antiseptic solution is reduced by 50-90%.

20. The method of claim 16 , wherein the chlorhexidine gluconate in the antiseptic solution is reduced no more than 5%.