Vertical cavity surface emitting semiconductor laser device
View Patent ↗The relationship between the reflectivity characteristic of a DBR layer(s), in which an InP layer and an InGaAlAs layer are laminated alternatively, and the optical absorption characteristic of the InGaAlAs layer, is a trade-off in a vertical cavity surface emitting laser on an InP substrate. The present invention applies a semiconductor DBR layer(s), in which an InP layer and an InGaAlAs-MQW (multi-quantum-wells) layer are laminated alternatively, in order to dissolve the above trade-off. The InGaAlAs-MQW layer is composed of InGaAlAs-wells and barriers. The InP layer is doped uniformly and the InGaAlAs-MQW layer has a structure in which at least a part thereof is doped.
1. The vertical cavity surface emitting semiconductor laser device for emitting light vertically to an InP substrate comprising an active layer that generates light onto the InP substrate and a cavity-structure in which the upper and lower sides of the active layer are sandwiched by first and second reflectors in order to obtain a lasing light from light generated from the active layer,
wherein the first reflector laminated on the InP substrate is comprised of first semiconductor layers, the active layer is laminated above the first reflector, and the second reflector laminated above the active layer is comprised of second semiconductor layers or first dielectric layers,
wherein a partial region of the first semiconductor layers is doped with impurities as to be a first conductivity type so that current can be injected from the first semiconductor layers to the active layer, and
the first semiconductor layers comprise a plurality of pairs of a multi-quantum-wells layer and an InP layer, wherein the plurality of pairs are laminated alternatively and the multi-quantum-wells layer is comprised of InGaAlAs-wells and InGaAlAs-barriers, wherein the InGaAlAs-wells of the multi-quantum-wells layer within the first semiconductor layers in the first reflector are undoped, and the InGaAlAs-barriers are doped.
2. The vertical cavity surface emitting semiconductor laser device for emitting light vertically to an InP substrate comprising an active layer that generates light onto the InP substrate and a cavity-structure in which the upper and lower sides of the active layer are sandwiched by first and second reflectors in order to obtain a lasing light from light generated from the active layer,
wherein the first reflector laminated on the InP substrate is comprised of first semiconductor layers, the active layer is laminated above the first reflector, and the second reflector laminated above the active layer is comprised of second semiconductor layers or first dielectric layers,
wherein a partial region of the first semiconductor layers is doped with impurities as to be a first conductivity type so that current can be injected from the first semiconductor layers to the active layer, and
the first semiconductor layers comprise a plurality of pairs of a multi-quantum-wells layer and an InP layer, wherein the plurality of pairs are laminated alternatively and the multi-quantum-wells layer is comprised of InGaAlAs-wells and InGaAlAs-barriers, wherein a doping concentration of the InGaAlAs-barriers is higher than a doping concentration of the InGaAlAs-wells of the multi-quantum-wells layer within the first semiconductor layers in the first reflector.
3. The vertical cavity surface emitting semiconductor laser device according to either claim 1 or claim 2 , wherein at least a partial region of the first group of layers of the first semiconductor layers is doped, and the second group of layers of the first semiconductor layers is undoped.
4. The vertical cavity surface emitting semiconductor laser device according to either claim 1 or claim 2 , wherein a wavelength that defines a composition of a compound semiconductor of the InGaAlAs-wells is in a range from 1.2 μm to 1.6 μm, and a wavelength that defines a composition of a compound semiconductor of the InGaAlAs-barriers is in a range from 0.88 μm to 1.15 μm.
5. The vertical cavity surface emitting semiconductor laser device according to either claim 1 or claim 2 , further comprising a tunnel junction within semiconductor layers below the second reflector wherein the tunnel junction is formed on the active layer.
6. The vertical cavity surface emitting semiconductor laser device according to either claim 1 or claim 2 , wherein an oscillation wavelength of laser is in a range from 1.2 μm to 1.6 μm band.