IP Library › Patent Application 11682573
Patent Application
App. No. 11/682,573

Advanced Illumination System for Use in Microlithography

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Quick Facts
Patent No.
US None
App. No.
11/682,573
Abstract

A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Claims (8)

1 - 32 . (canceled)

33 . A system for microlithography comprising:

an illumination source;

an illumination optical system including, in order from an objective side:

(a) a first diffractive optical element that receives illumination from said illumination source;

(b) a second diffractive optical element;

(c) a condenser lens; and

(d) a relay lens, wherein an illumination field between the condenser and the relay lens are continuously adjustable.